Page Comparison

List of pages to be added:

1. Edge bead Removal
2. Pre-exposure bake
3. Post-exposure bake
4. Multilayer spins
5. Characterization of spun films
6. Etch resistance

ECE 695Q - Nanometer Scale Patterning and Processing: https://nanohub.org/resources/24028

Lithographic Processing Overview:

ICs, Lithography, and Photoresist - Henderson Research Group, GA Tech

University Nanofabrication/Cleanroom resources:

• UPenn - Singh Center for Nanotechnology
• nanoFAB - University of Alberta
• CMI - EPFL
• University of Utah - Nanofab
• UC Irvine - INRF
• University of Louisville - Micro/Nano Technology Center
• RPI - Micro and Nano Fabrication Clean Room
• RIT - Semiconductor and Microsystems Fabrication Laboratory

Manufacturer resources:

• MircroChemicals - Application Notes