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Announcement

On behalf of the Birck Leadership Team…….

Dear Birck Research Community,

The Purdue winter recess begins Friday December 22rd and concludes Tuesday morning, January 2.  The university is officially closed during this time.  As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system).  Following is a description of the Birck center during this period of university closure: 

1.       All labs and cleanroom will be open.

2.       All hazardous gases will be unavailable.

3.      Any work with highly dermally toxic materials (25% TMAH, BOE, HF) ABSOLUTELY requires a buddy within eyesight at all times.

4.       Precursors for ALD systems will be available.

5.       No shipping or receiving is being done at any building on campus.

6.       The custodians will not be working so restrooms will not be maintained and waste/trash will not be removed. 

o    We encourage users to keep the facility clean and be extra vigilant about the hygiene.

7.      Due to the lack of staffing, any faculty and senior researchers present are encouraged to be more proactive (e.g. occasional walk-throughs checking the labs where there is ongoing research).  Email sejurss@purdue.edu if you notice anything.

Since there will be very limited staff support during this winter recess the research groups are strongly encouraged to accomplish as much processing as possible before gases are turned off on Dec. 21.

See the following for more detailed information (this will be up on the BNC Wiki)
Excerpt

2023-12-22 to 2024-01-02:

  Reduced

 Reduced Holiday Operations

Due to Purdue’s Winter Recess

 

hazardous gases will be unavailable from 3:30 PM Thursday, December

21st until

21st until 8:00 AM on Tuesday, Jan

2nd

2nd.

  Lab

 Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the “buddy” system).

 

Please note the following changes to our normal operation:

o   
  • ALD sources will remain available
§  
  • Unavailable gases:
      ·                 
        • Ammonia (NH3)
      ·
        • Boron trichloride  
      Boron trichloride 
        • (BCl3)
      ·                 
        • Chlorine (Cl2)
      ·
        • Dichlorosilane  
      Dichlorosilane          
        • (H2Cl2Si)
      ·
        • Hydrogen  
      Hydrogen          
        • (H2)
      ·
        • Hydrogen Sulfide  
      Hydrogen Sulfide          
        • (H2S)
      ·
        • Krypton Fluoride  
      Krypton Fluoride          
        • (KrF)
      ·
        • Methane  
      Methane          
        • (CH4)
      ·
        • Nitric Oxide  
      Nitric Oxide          
        • (NO)
      ·
        • Silane  
      Silane          
        • (SiH4)
      ·
        • Trichlorosilane  
      Trichlorosilane 
        • (HCl3Si)
      §  
      • Tools affected:
          ·         
            • Reduced capability:
              o   
                  • PVD Nitride Sputtering
              System 
                  • System  (NH3 unavailable)
              o   
                  • Tube 1 Clean
              Ox 
                  • Ox  (H2 unavailable, dry oxidation only)
              o   
                  • Tube 4 Field
              OX 
                  • OX  (H2 unavailable, dry oxidation only)
              o   
                  • Tube 7 General
              Oxidation    
                  • Oxidation  (H2 unavailable, dry oxidation only)
              o
                  • Panasonic  
              Panasonic 
                  • (Cl2 and BCl3 unavailable)
              o   
                  • Plasma-Therm Apex SLR ICP RIE Etcher (H2, Cl2 and BCl3 unavailable)
              ·           
                • Shutdown:
                  o
                      • Axic PECVD  
                  Axic PECVD 
                      • (NH3 & SiH4 unavailable)
                  o   
                      • Easy Tube 3000
                  DVD    
                      • DVD  (CH4 unavailable)
                  o
                      • Epigress  
                  Epigress    
                      • (SiH4 unavailable)
                  o
                      • H2S CVD  
                  H2S CVD 
                      • (H2S & H2 unavailable)
                  o   
                      • Nitric Oxide
                  Anneal 
                      • Anneal  (NO unavailable)
                  o   
                      • Plasma-Therm Apex SLR
                  HDPCVD 
                      • HDPCVD  (SiH4 unavailable)
                  o   
                      • Tube 2
                  Nitride 
                      • Nitride  (NH3 and HCl3Si unavailable)
                  o   
                      • Tube 3
                  LTO 
                      • LTO  (SiH4 unavailable)
                  o   
                      • Tube 6
                  Polysilicon 
                      • Polysilicon  (SiH4 unavailable)
                  ·         
                    • Work with highly dermally toxic materials (25% TMAH, BOE, HF) ABSOLUTELY requires a buddy within eyesight at all times.
                  ·         
                  • Custodial staff will not be working.
                  ·         
                  • There will be no restocking of shared use supplies.
                  ·         
                  • There will be no availability of engineering staff to answer questions or repair down equipment. 
                      o   
                        • On metallization tools sources will not be changed and depositions must be < 200 nm.
                      o   
                        • “Preliminary” reservations that require staff approval will not be approved during this time.

                      Contact Steve Jurss (

                      sejurss@purdue

                      sejurss@purdue.edu) with any questions.