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Protemp Horizontal Furnace - Tube 02 - Silicon Nitride Deposition
iLab Name: C - Tube 02 Nitride Dep
iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler
Location: Cleanroom - R Bay
Maximum Wafer Size: 6"/150 mm (for all furnaces)
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Overview
General Description
Horizontal furnaces for a variety of processes.
Specifications
Process Capabilities:
- Tube 02 - LPCVD Nitride Deposition
Process Temperatures:
- Tube 02 - 800°C maximum
Technology Overview
Sample Requirements and Preparation
Standard Operating Procedure
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Questions & Troubleshooting
How long can my recipe go for with this tube? I want to make a thick deposition.
References
The current maximum length at 800°C is approximately 76 minutes. If this is exceeded you risk melting the silicone o-ring holding the Ammonia and Dicholorosliane in. If you need to do depositions longer than 76 minutes you can re-run the cycle after it fully completes the first time, which gives the o-ring time to cool down.