CrossLab Name: Cleanroom Ellipsometer
FIC: Shared
Owner: Dan Hosler
Location: Cleanroom - P Bay
Maximum Wafer Size: 6"/150 mm

Overview

General Description

The cleanroom Ellipsometer can measure the thickness and refractive index of thin films on reflective substrates, as well as the optical properties of bare substrates.

Specifications

The stage can handle up to a 6 inch wafer diameter
The ellipsometer utilizes a single laser at a wavelength of 6328Å
Film Thickness Range: 0-60,000 Angstroms
Spot size is approximately 1mm by 3mm
Your substrate must be polished and must not rough to defract the laser

Technology Overview

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting