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Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

  

StatusUP

Issue Date and Description

2/8/2020 Contamination Issue

Estimated Fix Date and Comment

2/13/2020 Pole piece has been properly cleaned
Responding StaffAlejandro Alcaraz



/wiki/spaces/BNCWiki/pages/6240674

iLab Name: Thermo Scientific Apreo S
iLab Kiosk: Purdue Electron Microscopy Facility
FIC: Rosa Diaz
Owner: Alejandro Ramirez
Location: Cleanroom - N Bay
Maximum Wafer Size: 6"/150 mm

Overview

General Description

The most versatile high-performance SEM. The Thermo Scientific™ Apreo scanning electron microscope's (SEM) revolutionary compound lens design combines electrostatic and magnetic immersion technology to yield unprecedented resolution and signal selection. The Apreo SEM benefits from the unique in-lens backscatter detection, which provides excellent materials contrast, even at tilt, short working distance, or on sensitive samples.

 Specifications

Electron optics

  • High-resolution field emission SEM column with: 
    • High-stability Schottky field emission gun to provide stable high-resolution analytical currents 
    • Compound final lens: a combined electrostatic, field-free magnetic and immersion magnetic objective lens* 
    • 60° objective lens geometry: allows tilting larger samples 
  • Automated heated apertures to ensure cleanliness and touch free aperture changes 
  • Through-the-lens differential pumping for low vacuum* reduces beam skirting for the most accurate analysis and highest resolution • Beam deceleration with stage bias from -4000 V to +600 V 
  • Continuous beam current control and optimized aperture angle 
  • Double stage scanning deflection 
  • Easy gun installation and maintenance – auto bake-out, auto start, no mechanical alignments 
  • Guaranteed minimal source lifetime: 24 months

Electron Beam Resolution at optimum WD

  • 30 kV - 0.8 nm
  • 15 kV - 0.7 nm
  • 1 kV - 1.0 nm

Electron beam parameter space

  • Compound Final lens
  • Beam current range: 1 pA to 400 nA 
  • Accelerating voltage range: 200 V–30 kV 
  • Landing energy range: 20 eV–30 keV 
  • Max. Horizontal Field Width: 3.0 mm at 10 mm WD (corresponds to 29x minimum magnification).

Stage and sample

  • Type - Eucentric goniometer stage, 5-axes motorized 
  • XY - 110 × 110 mm 
  • Repeatability - < 3.0 μm (@ 0° tilt) 
  • Motorized Z - 65 mm 
  • Rotation - n × 360° Tilt -15° / +90° 
  • Max. sample height - Clearance 85 mm to eucentric point 
  • Max. sample weight - 500 g in any stage position (up to 2 kg at 0° tilt) 
  • Max. sample size - 122 mm diameter with full X,Y, rotation (larger samples possible with limited stage travel or rotation)

Sample Requirements and Preparation

Samples should be conductive to maximize sample imaging. With conductive samples features of 10nm can be observed with 5kV. Nonconductive samples can still be imaged, but not small features, limiting smallest resolutions to hundreds of nm, even microns, at low beam voltages (1-5kV). Non-conductive samples can become conductive if they are coated with Carbon, Au-Pd, or Silver paint.

Standard Operating Procedure

 Quick guide... click here to expand

QUICK GUIDE (Complete Guide in computer desktop)

            i           Vent system (wait ~3 minutes)

           ii           Load sample on Multipurpose Stub holder (MSH)

  1. Avoid stubs with dimensions that exceed the MSH area.

          iii          Pump system (wait ~3 minutes)

          iv         Take Nav Cam Picture

                     a.Zero x and y coordinates

                     b.Stage – Take Nav-Cam Photo

           v           Define Mode and Detector

          vi          Watch while moving stage holder up slowly until

 10mm initial Working Distance is reached

  1. Use scroll wheel of mouse or move in 10mm

steps the Z-direction of the stage.

         vii         Turn Beam ON

  1. Initial Voltage 1-5kV

         viii        Find area of interest. Adjust Magnification, Focus

and Link. Fix Stigmation and Alignments.

          ix          Take Picture

           x           Turn Beam Off

          xi          Vent system (wait 3 minutes)

         xii         Unload sample on Universal Standard Holder (USH).

         xiii        Pump system (wait 3 minutes)

If needed, open User Guide (Help Tab) or read Apreo Manual


Questions & Troubleshooting

Any questions? Please write them down here or contact the Electron Microscopy Staff

References

  • Inkson, B. J. "Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) for materials characterization." Materials characterization using nondestructive evaluation (NDE) methods. Woodhead Publishing, 2016. 17-43.
  • Sharma, Surender Kumar, et al., eds. Handbook of Materials Characterization. Springer International Publishing, 2018.
  • Reimer, Ludwig. Scanning electron microscopy: physics of image formation and microanalysis. Vol. 45. Springer, 2013.


Manufacturer References

Manufacturer Website

Manufacturer References - Internal Resources

Apreo Data Sheet



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