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<font size="6">Suss MJB 3 UV400 Mask Aligner</font> |
iLab Name: MJB3_1 and MJB3_2
iLab Kiosk: BRK Lithography Core
FIC: David Janes
Owner: Joon Park & Mihailo Bradash
Location: Cleanroom - N Bay
Maximum Wafer Size: 3"/75 mm
The Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a cleanroom environment. The MJB3 offers unsurpassed flexibility in the handling of irregularly shaped substrates and pieces of differing thicknesses, as well as standard size wafers up to 3 inches in diameter.
Output intensity:
CP | CI1 | CI2 |
---|---|---|
300W | 8.0 mW/cm2 at 365 nm (i-line) | 14.0 mW/cm2 at 405 nm (h-line) |
Samples should be cleaned and prepared with further processing steps in mind, as well as conditions that enable good adhesion between the substrate and photoresist.
For the aligner itself, samples must be free of resist on the substrate backside. If any resist or residue is present, it should be removed with the following process:
The MJB3 uses a self leveling stage to automatically planarize the substrate chuck against the photomask when contact mode is engaged. This works well for wafers, but this mechanism must be considered when using small substrate pieces. When exposing on a single piece, be sure to place it directly in the center of the chuck. To further assist in proper planarization, place 3 spare substrate pieces evenly separated towards the edges of the chuck.
Why is the "Nitrogen Loss" light flashing when I turn on the machine?
The "Nitrogen Loss" light may flash when the machine is turned off in iLabs before the machine has been powered off. To fix, power off the machine, disable in iLab, re-enable in iLab, and then power the machine back on. After doing this, email core staff so your previous reservation can be removed to prevent a double charge.
Why am I having so much trouble aligning for a two step lithography?
Alignment issues are typically due either to sample placement or the WEC head being out of alignment.
1) When using small samples, be sure to place them in the center of the chuck if at all possible. If this is not possible, placing 3 "helper" pieces may level the sample. See Proper Alignment of Wafer Pieces for more info.
2 )The WEC (Wedge Error Correction) head of the MJB may have drifted out of alignment. This would cause a drift in location when trying to raise the sample into contact, and would likely only be noticeable for multistep lithography alignments. Please let BNC staff know if you suspect the WEC head is not level and it will be checked.
Why isn't the height adjustment working? Why won't the contact level raise my sample into contact even though everything else is set properly?
The height adjustment knob (Z control) has likely been run beyond the lower limit or upper limit. Just report it to the staff and leave as it is.
Why is the X or Y micrometer fine adjustment unable to rotate at all?
The fine knob has been moved far beyond the travel range. Contact core staff to fix.
How do I start the lamp power supply?
BNC standard procedure is to leave the lamp power supply "on" at all times. In the rare event that a previous user has turned off the lamp power supply, follow the instructions below to restart it:
The power supply shows "rdy", what do I do?
Starting from Step 3 in How do I start the power supply? follow the remainder of the steps. There is no need to power cycle the power supply.
Photoresist | Thickness (μm) | Exposure Time (s) | Notes | Type |
---|---|---|---|---|
AZ1518 | 1.5-3.0 | 18 | Si substrate | BNC Standard |
References