Expertech Horizontal Furnace - Tube 05 - General Anneal

iLab Name: C - Tube 05 General Anneal
iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler & Nicholas Glassmaker
Location: Cleanroom - R Bay
Maximum Wafer Size: 8"/200 mm

Overview

 General Anneal up to 600C - All sizes up to and including 8” Si wafers

SOP

Expertech Horizontal Furnaces

General Description

Open

Tube 5 General Anneal

Specifications

Process Capabilities

• Tube 05 - Anneal up to 600C in N2, 96%N2/4%H2 FG, or Ar.

Process Temperatures

• Tube 05 - 600°C maximum 

Process Gasses

• Forming Gas (96% N2, 4% H2)

• Argon

• Nitrogen

Cleaning/Material Requirements

• Minimum of triple solvent clean, Piranha clean or RCA Clean are ideal.

• Samples must be bare Silicon, diced samples up to 8” wafers.

• No photoresist allowed.

Recipes

Annealing with any of the provided gasses for general annealing.

Other Recipes:

Consult with tool engineer.