i. F54-XY enclosure

ii. Sample Stage

iii. Light Source

iv. Spectrometer

v. Filmetrics Focus/Reflectance/Thickness Standard wafer

4.1        Log into iLab and enable the F54.

4.2        Open the FILMapper software by double clicking on the desktop icon. Wait for the software to initialize. There should be a window with 3 tabs at the top; Wafer Map, Measure and History. The Wafer Map tab is used for mapping the measured samples, the Measure tab is for single point measurements and the History tab is for reviewing historical data.

4.3        Select the Measure tab and then select the “Go To…” button. The Go To Wafer Location window will open.

4.4        Select the “Go To Unload” button. Wait for the wafer chuck to move toward the front of the F54 enclosure.

BASELINE

4.5        Open the front door and use tweezers or a vacuum wand to load the Focus/Reflectance/Thickness Standard (located in the wafer compact) on the center of the F54 substrate chuck. This is a silicon wafer and is extremely fragile.

4.6        Close the front door and then select the “Go To Load” button.

4.7        Select the “OK” button in the “Go To Wafer Location” which will close this window.

4.8        Select the “Live Video” in the left camera window if it is not already active. The Zoom slider is a digital zoom for the optical magnification. The measurement spot should be visible in the center of the Live Video image.

4.9        Select the “SiO2 on Si F54-XY” recipe in the far right dropdown window (under “Baseline” and “Analyze”) then click on OK.

4.10      Left click on the “Baseline” button.

4.11      Left click on the “Take Sample Reflectance” button.

4.13      Select the “Auto Focus” button in the “Measurement Spot Focus” window and wait for the video to focus.

4.12      Enter “30” in the “X (mm) box on the “Measurement Spot Focus” window then select the “Move” button.

4.14      Click “OK” after the live video is in focus and wait for the status bar to fill.

4.15      Click on the “Take Reflectance Standard” button for step 2 of 2.

4.16      Select “OK” in the “Measurement Spot Focus” window and wait for the Status bar to fill.

4.17      Select the “Go To” button and enter “30” in the “X” box, then select “OK”.

4.18      Click on the “Measure” button and wait for the spectrum analysis to complete.

4.19      The Measurement results are displayed in the lower right area of the monitor. Compare the SiO2 measured
             value with the value listed on the wafer compact. The measurement should be very close (within a few
             percent) of the actual thickness printed on the compact. If not, contact Birck Staff for support.

              NOTE: “Goodness of fit” is how well the measured value matches the expected value; 1 is a perfect fit

MAPPING MULTIPLE POINTS

4.20      The Baseline must be performed before proceeding.

4.21      Click on the “Map” tab to map a sample for film thickness and uniformity data on a non-patterned large
             (50mm - 200mm) sample. The number of data points can vary from 1 up to 115 points.

4.22      Select the Recipe dropdown window located below the sample diameter to select the film recipe to be used
             and a preview will be displayed
4.23      Place the sample in the center of the sample stage using the circles on the stage as a reference.

4.24      Use the Up and Down arrow next to “Focus:” (“Measure” tab) to bring the sample into focus. The single arrows
             are slow up/down movement and the double arrows are fast up/down movement. Return to the “Map” tab.

4.25      Click on the “Start” button. The individual data points can be seen under the “History” tab. Minimize the lower
             window (click the down  button) to display dataset statistics. The display can be changed for more options.

4.26      Perform the Shutdown procedure at the end of the session.

SINGLE POINT MEASUREMENTS
4.27      The Baseline must be performed before proceeding

4.28      Any sample size and shape can be measured. Larger samples should be centered on the stage and smaller
             samples should be offset so they lay flat on the stage surface (not on the mounting hardware).

4.29      Select the Measure tab and then select the “Go To…” button. The Go To Wafer Location window will open.

4.30      Select the “Go To Unload” button. Wait for the wafer chuck to move toward the front of the F54 enclosure.

4.31      Open the front door and use tweezers to load the sample to be measured.

4.32      Close the front door and then select the “Go To Load” button.

4.33      Select the “OK” button in the “Go To Wafer Location” which will close this window.

4.34      Select the “Live Video” in the left camera window if it is not already active. The Zoom slider is a digital zoom for the optical magnification. The measurement spot should be visible in the center of the Live Video image. The single (slow) or double arrows (fast) in the “Live Video” window will move the sample in the selected direction.

4.35      Position the yellow dot in the “Live Video” over the area to be measured.

4.36      Select the desired recipe using the dropdown menu on the right side of the screen

4.37      Press the “Measure” Button side of the window.

4.38      The Measurement results are displayed in the lower right area of the monitor.

4.39      Perform the Shutdown procedure at the end of the session.

EDITING RECIPES

5.1        Select the “Measure” tab and click on the “Edit Recipe” button.

5.2        Select the “Film Stack” tab and make adjustments to the appropriate layer or approximate (nominal) thickness.

5.3        Select the “Analysis Options” tab for Wavelength options and Analysis method.

5.4        Select the “Alarms” tab for poor measurement alert settings.

5.5        Select the “Map” tab for Measurement configuration including wafer size, coordinate system, number of points
             to measure and the edge exclusion.

5.6        Additional recipe parameter details can be found in Section2 of the Filmetrics User Manual. A copy of the
            manual can be found on the Birck Wiki.

5.7        This is NOT AN OPTION --Use the SAVE AS button (shown below) and create a different/unique filename before clicking on “Save”. File>save measured Spectrum

5.8        Click on “OK” and try the new recipe.

SAVING DATA

5.9        Select “File” on the “Measure” tab before clicking on the “Save Measured Spectrum…” option.

5.10      Create a folder with your name under C:<<Users>Filmetrics Users>Documents and enter a name before
             clicking on “Save”

5.11      Another option is to save a screen shot by selecting “Save Screen to File…” option.

5.12      Create a folder with your name under C:<<Users>Public>Public Documents and enter a name before
             clicking on “Save”

5.13      The data can be saved to a new, virus free USB storage device by plugging it into the USB port located on the
             left side of the PC monitor

SPECIFICATIONS

          5.14      Thickness Range with 15X Objective (film dependent and with a reflective objective): 4nm to 115mm

          5.15      Accuracy (film dependent): The greater of 1nm or 0.2%

          5.16      Minimum Thickness to measure n and k (film dependent and with a 5X objective): 50nm

          5.17      Spectrometer Wavelength Range: 190nm – 1700nm

STARTUP

6.1        Open the FILMapper software located on the computer desktop.

6.2        Warmup wait time must be 5 minutes for films thicker than 250nm or 15 minutes for films thinner than 25nm
             or if measuring the refractive index.

SHUTDOWN

6.4        Verify sample has been removed from the stage.

6.5        Close the software by clicking on the (red) “x” in the upper right corner of the monitor