Expertech Horizontal Furnace - Tube 8 - High Temperature Anneal

iLab Name: C - Tube 8 High Temp Anneal
iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler & Nicholas Glassmaker
Location: Cleanroom - R Bay
Maximum Wafer Size: 8"/200 mm

Overview

 High-Temperature Annealing - 300-1100°C - All sizes up to and including 8” Si wafers

SOP

Expertech Horizontal Furnaces | Standard Operating ProcedurePreview

General Description

Open

Wafer Loading on Tube 8

Specifications

Process Capabilities

• Anneal of samples in various gasses

Process Temperatures

• Tube 8 - 300°C - 1100°C maximum 

Process Gasses

• Hydrogen (restricted to oxidation only)

• Oxygen

• Nitrogen

• Forming Gas (96% N2, 4% H2)

• Nitric Oxide (NO) (planned for future use)

• Argon

Cleaning/Material Requirements

• Minimum of triple solvent clean, Piranha or RCA Clean is required for high temperatures and gives best results

• Sample size from diced samples up to 8” wafers

• No metals or photoresist allowed

Recipes

Annealing

Exposure of samples to a set temperature and gas combination. Custom recipes available upon request.