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List of pages to be added:

  1. Edge bead Removal
  2. Pre-exposure bake
  3. Post-exposure bake
  4. Multilayer spins
  5. Characterization of spun films
  6. Etch resistance

ECE 695Q - Nanometer Scale Patterning and Processing: https://nanohub.org/resources/24028


Lithographic Processing Overview:

ICs, Lithography, and Photoresist - Henderson Research Group, GA Tech

 

University Nanofabrication/Cleanroom resources:

 

Manufacturer resources:

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