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2024-12-20 to 2025-01-02: Reduced Holiday Operations

Dear Birck Research Community,

The Purdue winter recess begins effective Friday afternoon December 20th and concludes Thursday morning, January 2. The university is officially closed during this time. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Click the link above to get more detail about equipment conditions and rules.


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp
Issue Date and Description


Estimated Fix Date and Comment

Responding StaffFrancis

Plasma-Therm Apex SLR HDPCVD

iLab Name

Plasma-Therm ICP RIE

iLab Kiosk


FIC

Shared

Owner

Francis Manfred

Location

Cleanroom - K Bay

Max. Wafer

6"

Internal Page
Staff Page

Overview

TypeMaterialsRestricted MaterialsAvailable GasesMax RF PowerWafer Size
ICP RIESi, Oxides, III-IV's, Ti, Al, SiCAu, Ag, Pt, CuAr, CHF3, CF4, SF6, Cl2, N2, O2, BCl3, H2, C4F82000 ICP / 600 Platen6 inch (150 mm) SEMI Specification

General Description

This is an example of a tip

This is an example of a tool warning

Specifications

Factory Support:

Plasma-Therm APEX SLR Website

Paris Harvey - Field Service Engineer

  • 727-687-7947 mobile
  • paris.harvey@plasmatherm.com
  • Paris did the initial tool commissioning and installation in August 2019. He was great to work with and had worked in manufacturing on these tools as well, so he knew it inside and out.

JJ Whitehead - Field Service Engineer

Specifications

Lower Electrode Temperature Range

  • 10 - 60°C

Chamber Leak Rate

Plasma Power Supply

  • 600W 13.56MHz Bias Supply
  • 2kW 2MHz ICP

Technology Overview - Remove if multiple tools use the same technology/process

 


Sample Requirements and Preparation


Standard Operating Procedure


Questions & Troubleshooting



Process Library

References




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