iLab Name: Thermo Scientific Apreo S
iLab Kiosk: Purdue Electron Microscopy Facility
FIC: Rosa Diaz
Owner: Xingtao Liu
Location: Cleanroom - N Bay
Maximum Wafer Size: 6"/150 mm
Overview
General Description
Specifications
Electron optics
- High-resolution field emission SEM column with:
- High-stability Schottky field emission gun to provide stable high-resolution analytical currents
- Compound final lens: a combined electrostatic, field-free magnetic and immersion magnetic objective lens*
- 60° objective lens geometry: allows tilting larger samples
- Automated heated apertures to ensure cleanliness and touch free aperture changes
- Through-the-lens differential pumping for low vacuum* reduces beam skirting for the most accurate analysis and highest resolution • Beam deceleration with stage bias from -4000 V to +600 V
- Continuous beam current control and optimized aperture angle
- Double stage scanning deflection
- Easy gun installation and maintenance – auto bake-out, auto start, no mechanical alignments
- Guaranteed minimal source lifetime: 24 months
Electron Beam Resolution at optimum WD
- 30 kV - 0.8 nm
- 15 kV - 0.7 nm
- 1 kV - 1.0 nm
Electron beam parameter space
- Compound Final lens
- Beam current range: 1 pA to 400 nA
- Accelerating voltage range: 200 V–30 kV
- Landing energy range: 20 eV–30 keV
- Max. Horizontal Field Width: 3.0 mm at 10 mm WD (corresponds to 29x minimum magnification).
Stage and sample
- Type - Eucentric goniometer stage, 5-axes motorized
- XY - 110 × 110 mm
- Repeatability - < 3.0 μm (@ 0° tilt)
- Motorized Z - 65 mm
- Rotation - n × 360° Tilt -15° / +90°
- Max. sample height - Clearance 85 mm to eucentric point
- Max. sample weight - 500 g in any stage position (up to 2 kg at 0° tilt)
- Max. sample size - 122 mm diameter with full X,Y, rotation (larger samples possible with limited stage travel or rotation)
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library