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Between 12/22/22 15:30 to 1/3/23 08:30 this tube is to be used for DRY O2 Oxidation only!
No H2 Usage due to holiday reduced operations.
iLab Name: C - Tube 01 Clean Ox
iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler
Location: Cleanroom - R Bay
Maximum Wafer Size: 6"/150 mm
Overview
General Description
Horizontal furnaces for a variety of processes.
Specifications
Process Capabilities:
- Tube 01 - Wet / Dry Oxidation (Super-Clean Si users only)
Process Temperatures:
- Tube 01 - 1100°C maximum
All furnace tubes are capable of samples up to 6 inches in diameter.
Technology Overview
Sample Requirements and Preparation
Standard Operating Procedure
- Thermal Oxidation
Questions & Troubleshooting
Process Library