This instruction covers the set-up and safe use of the Filmetrics F40-UV thin film measurement system.  This machine is a thin film measurement system that uses an ultraviolet light source and is capable of measuring a vertical film ranging between 4nm and 25µm. A Filmetrics F40-UV training video is also available. As with any tool in the BNC clean room, you must schedule time on the tool through iLab before use. 

1.    SAFETY REQUIREMENTS

a. Safety glasses must be worn whenever in the clean room, except when using a microscope or when wearing protective goggles.b. Keep fingers, samples, tweezers, pens and other materials clear of the Filmetrics F40-UV stage perimeter (pinch point) of the sample stage as noted by the yellow caution label.

2.    EQUIPMENT

a. Filmetrics F40F10-UVRT

i. F40F10-UV toolRT tool, model 205-0863, S/N 18D021

ii. Sample StageHold Down – F10 – RT (used to keep flexible samples flat)

iii. Light SourceFused Silica Reflectance Standard

iv. SpectrometerSilicon Reflectance Standard

v. Filmetrics Focus/Reflectance/Thickness Standard waferBK7 Reflectance Standard

vi. Dark Standard

vii. Hardcoat Thickness (4.3509um, S/N 062618-01)

3.    TOOL CONFIGURATION 

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4.    CYCLE OF OPERATION

a.        Verify all three buttons on the light source and F10-RT power indicator lamps on the base unit are lit as well as the “light source” toggle switch on the sample
             stage. shown in Figure 1.

b.        Verify the computer (grey box mounted on back of monitor shown in Figure 2) and monitor are powered on.
             Refer to Section 6 for the startup procedure.

bc.        Open the FILMapper FILMeasure software if it is not already running. Wait for the stage to move/initialize. There should be
             The FILMeasure will have a window with 3 2 tabs at

              the top; Map, Measure and History. The Map tab is used for mapping the measured
             samples, the Measure tab is for single point measurements related data and the History tab is for

              reviewing the historical data.

Baseline

c. Using tweezers, load the Focus/Reflectance/Thickness Standard (located in the wafer compact). This is a

             silicon wafer and is extremely fragile.
d. Select the “Measure” tab and turn on the camera image by slicking on “Live Video” in the left camera window.
             The Zoom slider is a digital zoom for the 10X optical magnification.

e. The 25 micron measurement spot should be visible in the center of the Live Video image.

f. Select the Map tab and then left click on the “Baseline” button.

g. Left click on the “Take Sample Reflectance” button before focusing (use the Z-axis up/down arrows in the

             “Measurement Spot Window”) on the Standard wafer.

h. Move the stage to X +30 for the Reflectance Measurement by typing in 30 next to “X” and clicking on “Move”

i. Click “OK” after the stage has stopped moving and wait for the status bar to fill. The “Thickness Standard” spot

             should be under the optic column.

j. Click on “Take Reflectance Standard”

k. Click “OK” after the stage has stopped moving and wait for the status bar to fill

l. When “Step 3 of 3: Take Background” appears on the screen, close the shutter by pressing the shutter button 
             on the Light Source

m. Click on “Take Background” button and wait for the status bar to fill

n. Click on the “Finish” button when the baseline procedure is complete.

o. Press the shutter button on the Light Source to open the shutter

p. Click on the Measure tab to measure the Standard Wafer oxide thickness

q. Select the “ZZZ SiO2 Std Wafer by Dan” recipe in the far right dropdown window and click on OK. Click OK if a 
             warning dialogue box appears

r. Click on the “Go To…” button and enter 30 for the “x” value before clicking on “Apply”, then “OK”. This will 
             move the sample stage to the SiO2 region of the standard wafer

s. d.        Accurate measurements with the F10-RT requires proper measurement set-up which will include

             selecting / editing the film stack, taking a baseline measurement and analyzing the measured spectrum.

BASELINE

e.        Verify the “Measurement” window is selected by left clicking on the “Measurement” tab

f.        Select the recipe from the dropdown window above “Edit Recipe” shown in Figure3.

g.        Click “OK”.

              NOTE: A baseline Warning may appear. A new baseline must be performed which will be indicated by the

              Baseline button flashing yellow

h.        Left click on the “Baseline…” button located on the right side of the window.

i.      Place your sample to be measured on the stage so the system can get a Reflectance value.

              NOTE: Sample films on silicon must be placed resist side down since the light cannot pass through the silicon.

              Metal can be placed facing up if it has been deposited on a glass plate/coupon

j.        Complete Step1 by left clicking on “Take Sample Reflectance.

k.       Select the appropriate standard as specified by the F10-RT tool, such as “Fused Silica (2-sided)” Reflectance

              Standard, from the clear storage case.

l.        Place the appropriate Reflectance Standard on the base so that the 2 locating pins are in the holes and you

             can read the vertical face of the reflectance standard identification tag (shown in Figure 3).

m.      Left click on “Take Reflectance Standard” button

n.       Remove the reflectance standard and return it to the storage case after the scan is complete.

o.       Left click on “Take Background”. The stage should not have any samples on it for this scan.

p.       Place the “Dark” standard on the stage

q.       Left click on the “Take Dark” button and wait for the scan to complete.

r.       Click on “Finish” after the scan is complete

s.       Return the “Dark” standard to the storage case.

t.       Place your sample to be measured on the stage.

              NOTE:

u.      Click on the “Measure” button and wait for the spectrum analysis to complete.

tv.      The Measurement results Results are displayed in on the lower right area side of the monitorMeasure window. Compare the SiO2 measured
             value with the value listed on the wafer sample compact (if specified). The measurement should be very close ( within 1%) of the
             actual thickness printed on the compactposted

              control limits. If not, contact Birck Staff for support.

              NOTE: “Goodness of fit” is how well the measured value matches the expected value; 1 is a perfect fit

u. Mapping Multiple Points

MEASUREMENT

w.      The Baseline must be performed before proceeding.

x.

iii. Select the Recipe dropdown window located below the sample diameter to select the film recipe to be used 
             and a preview will be displayed
iv. Place the sample in the center of the sample stage using the 25mm grid as a reference.

v. Use the Up and Down arrow next to “Focus:” (“Measure” tab) to bring the sample into focus. The single arrows 
             are slow up/down movement and the double arrows are fast up/down movement. Return to the “Map” tab.

vi. Click on the “Start” button. The individual data point can be seen under the “History” tab. Minimize the lower 
             window (click the down  button) to display dataset statistics. The display can be changed for more options.

vii. Perform the Shutdown procedure at the end of the session.

v. Single Point Measurements

i. The Baseline must be performed before proceeding

ii. Any sample size and shape can be measured. Larger samples should be centered on the stage and smaller 
             samples should be offset so they lay flat on the stage surface (not on the mounting hardware).

iii. Place the sample in the center of the sample stage using the 25mm grid as a reference. Offset small samples
             from the center of the sample stage so it will lay flat on the stage.

iv. Select the “Measure” tab and turn on the camera image by slicking on “Live Video” in the left camera window.

             The Zoom slider is a digital zoom for the 10X optical magnification.
v. Use the Up and Down arrow next to “Focus:” (“Measure” tab) to bring the sample into focus. The single arrows 
             are slow up/down movement and the double arrows are fast up/down movement.

vi. Position the yellow (25µm) dot in the “Live Video” over the area to be measured. The stage can be moved 
             using the buttons in the Live Video display.

vii. Select the desired recipe using the dropdown menu on the right side of the screen

viii. Press the “Measure” Button side of the window.

     Place the sample on the center of the F10-RT stage. The area of interest must appear in the center of the
             “Live Video”

y.       Left click on the “Measure” button and wait for the scan to complete.

z.       The measurement status will be replaced with the thickness value. The Measurement results will also be
             displayed in the lower right area of the

Measure window and will include the film thickness, goodness of fit
             (GoF) and Normalized FFT (Fast Fourier Transform) Intensity.

5.    SUPPLEMENTAL DATA (Edits and Saving Data)

a. Editing Recipes

i. Select the “Measure” tab and click on the “Edit Recipe” button.

1.     The upper left corner of the window gives these options; Open a saved recipe, Start a new recipe, Save the current settings, Save the current settings as a new recipe, Delete the current recipe

2.     Choose the desired Recipe Name from the dropdown menu in the upper left portion of the open
           window

ii.        Select the “Film Stack” tab and make adjustments to the appropriate layer or approximate (nominal) thickness.set the units, Layers, Nominal thickness and range

iii.        Select the “Analysis Options” tab for Wavelength options and Analysis method.to define the wavelength range to be analyzed and the smoothing function
(this system is not capable of using the Source data option)

iv.        Select the “Alarms” tab for poor measurement alert settings.

v. Select the “Map” tab for Measurement configuration including wafer size, coordinate system, number of points 
             to measure and the edge exclusion.

vi. Additional recipe parameter details can be found in Section2 of the Filmetrics User Manual. A copy of the 
            manual can be found on the Birck Wiki.

vii. This is NOT AN OPTION --Use the SAVE AS button (shown below) and create a different/unique filename before clicking on “Save”. File>save measured Spectrum 

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viii. Click on “OK” and try the new recipe.

b. Saving Data

i. Select “File” on the “Measure” tab before clicking on the “Save Measured Spectrum…” option.

ii. Create a folder with your name under C:<<Users>Filmetrics Users>Documents and enter a name before 
             clicking on “Save”

iii. Another option is to save a screen shot by selecting “Save Screen to File…” option.

iv. Create a folder with your name under C:<<Users>Filmetrics Users>Documents and enter a name before 
             clicking on “Save”

v. The data can be saved to a new, virus free USB storage device by plugging it into the USB port located on the 
             left side of the PC monitor                                                        to define the Goodness of Fit (GoF), to activate the alarms and define the thickness
             limits

v.         The “Acquisition Settings” tab options should be left at the default settings 

b. Performance Specifications

i.        Wavelength Range is 380nm – 1050nm

ii.        Thickness Range is 15nm – 70mm (material dependent)

iii.      Minimum thickness to measure n and k is 100nm

iv.      Accuracy is greater of either 0.2% or 2nm (material dependent)

v.      Precision is 0.02nm based on SiO₂-on-Si

vi.      Stability is 0.05nm

vii.      Measurement Spot Size is 6mm diameter                                                  

6.    STARTUP and SHUTDOWN

a. Startup

i. Depress each of the three buttons on the light source box (Deuterium lamp, Shutter and Halogen lamp).ii.         Verify the light source rocker switch is in the on position (top half flush with panel) and the lamp is illuminated.

ii.        Verify the rocker switch next to the power connector on the back of the F10-RT tool is in the “I” position and

             the green main power indicator on the front panel is illuminated

iii.        Turn on the computer (grey box mounted on back of monitor) by depressing the button shown in Figure2

iv.        Turn on the monitor by depressing the rightmost power button under the display screen

v.         Warmup wait time must be 5 minutes for films thicker than 250nm or 15 minutes for films thinner than 25nm
             or if measuring the refractive index.

iiivi.        Open the FILMapper FILMeasure software located on the computer desktop and wait for the stage to move/initialize.

b. Shutdown

i.        Verify sample has been removed from the stage.

ii.        Close the software by clicking on the (red) “x” in the upper right corner of the monitor

iii. Turn off the Deuterium lamp, Shutter and Halogen lamp by pressing the three buttons on the light source.

        Shutdown Windows by left clicking on the “Windows” icon in the lower right corner, select the power button
and select the shut down option

iv.        Turn off the monitor.