Page Properties | ||||||||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| ||||||||||||||||
|
/wiki/spaces/BNCWiki/pages/6236040
iLab Name: Filmetrics F10-RT
iLab Kiosk: BRK Metrology Core
FIC: Shared
Owner: Rich Harlan
Location: Cleanroom - M Bay
Measurement Spot Size: 6mm spot size diameter
Table of Content Zone | ||||||||
---|---|---|---|---|---|---|---|---|
| ||||||||
|
Overview
General Description
The Filmetrics F10-RT is used to measure the thickness and optical constants (n and k) of transparent and semi-transparent thin film such as oxides, nitrides, resists, polyimides, and polysilicon. The Filmetrics measures film characteristics by reflecting light and then analyzing this light over a range of wavelengths.
Specifications
Measured films should be optically smooth. Very rough films and opaque films can not be measured.
- Thickness Measurement Range: 15 nm to 70 um (material dependent).
- Minimum Thickness to Measure n and k: 100 nm.
- Accuracy: Greater of 2 nm or 0.2% (Note that this is material dependent).
- Precision: 0.02 nm based on SiO2-on-Si.
- Stability: 0.05 nm.
- Spot Size: 6mm diameter
- Wavelength Range: 380 nm to 1050 nm
- Note: Thickness measurement range and accuracy are material dependent.
- Note: Precision and Stability ratings based on 100 measurements of 1 um SiO2 over 20 successive days.
Substrate material: If the film is on a rough substrate (which includes most metals), generally the film's refractive index cannot be measured. In addition, rough substrates limit the minimum measurable film thickness.
Sample Requirements and Preparation
To get accurate reflections, samples should be clean, dry, and free of organic residue. Additionally, rough films may not measure properly. The substrate should ideally be reflective or transparent.
Standard Operating Procedure
Expand | ||
---|---|---|
| ||
This instruction covers the set-up and safe use of the Filmetrics F40-UV thin film measurement system. This machine is a thin film measurement system that uses an ultraviolet light source and is capable of measuring a vertical film ranging between 4nm and 25µm. A Filmetrics F40-UV training video is also available. As with any tool in the BNC clean room, you must schedule time on the tool through iLab before use. 1. SAFETY REQUIREMENTSa. Safety glasses must be worn whenever in the clean room, except when using a microscope or when wearing protective goggles. 2. EQUIPMENTa. Filmetrics F10-RT i. F10-RT tool, model 205-0863, S/N 18D021 ii. Sample Hold Down – F10 – RT (used to keep flexible samples flat) iii. Fused Silica Reflectance Standard iv. Silicon Reflectance Standard v. BK7 Reflectance Standard vi. Dark Standard vii. Hardcoat Thickness (4.3509um, S/N 062618-01) 3. TOOL CONFIGURATION4. CYCLE OF OPERATIONa. Verify the light source and F10-RT power indicator lamps on the base unit are lit as shown in Figure 1. b. Verify the computer (grey box mounted on back of monitor shown in Figure 2) and monitor are powered on. c. Open the FILMeasure software if it is not already running. The FILMeasure will have a window with 2 tabs at the top; Measure and History. The Measure tab is for measurements related data and the History tab is for reviewing the historical data. d. Accurate measurements with the F10-RT requires proper measurement set-up which will include selecting / editing the film stack, taking a baseline measurement and analyzing the measured spectrum. BASELINE e. Verify the “Measurement” window is selected by left clicking on the “Measurement” tab f. Select the recipe from the dropdown window above “Edit Recipe” shown in Figure3. g. Click “OK”. NOTE: A baseline Warning may appear. A new baseline must be performed which will be indicated by the Baseline button flashing yellow h. Left click on the “Baseline…” button located on the right side of the window. i. Place your sample to be measured on the stage so the system can get a Reflectance value. NOTE: Sample films on silicon must be placed resist side down since the light cannot pass through the silicon. Metal can be placed facing up if it has been deposited on a glass plate/coupon j. Complete Step1 by left clicking on “Take Sample Reflectance. k. Select the appropriate standard as specified by the F10-RT tool, such as “Fused Silica (2-sided)” Reflectance Standard, from the clear storage case. l. Place the appropriate Reflectance Standard on the base so that the 2 locating pins are in the holes and you can read the vertical face of the reflectance standard identification tag (shown in Figure 3). m. Left click on “Take Reflectance Standard” button n. Remove the reflectance standard and return it to the storage case after the scan is complete. o. Left click on “Take Background”. The stage should not have any samples on it for this scan. p. Place the “Dark” standard on the stage q. Left click on the “Take Dark” button and wait for the scan to complete. r. Click on “Finish” after the scan is complete s. Return the “Dark” standard to the storage case. t. Place your sample to be measured on the stage. NOTE: u. Click on the “Measure” button and wait for the spectrum analysis to complete. v. The Measurement Results are displayed on the right side of the Measure window. Compare the measured control limits. If not, contact Birck Staff for support. NOTE: “Goodness of fit” is how well the measured value matches the expected value; 1 is a perfect fit MEASUREMENT w. The Baseline must be performed before proceeding. x. Place the sample on the center of the F10-RT stage. The area of interest must appear in the center of the y. Left click on the “Measure” button and wait for the scan to complete. z. The measurement status will be replaced with the thickness value. The Measurement results will also be
5. SUPPLEMENTAL DATA (Edits and Saving Data)a. Editing Recipes i. Select the “Measure” tab and click on the “Edit Recipe” button. 1. The upper left corner of the window gives these options; Open a saved recipe, Start a new recipe, Save the current settings, Save the current settings as a new recipe, Delete the current recipe 2. Choose the desired Recipe Name from the dropdown menu in the upper left portion of the open ii. Select the “Film Stack” tab to set the units, Layers, Nominal thickness and range iii. Select the “Analysis Options” tab to define the wavelength range to be analyzed and the smoothing function iv. Select the “Alarms” tab to define the Goodness of Fit (GoF), to activate the alarms and define the thickness v. The “Acquisition Settings” tab options should be left at the default settings b. Performance Specifications i. Wavelength Range is 380nm – 1050nm ii. Thickness Range is 15nm – 70mm (material dependent) iii. Minimum thickness to measure n and k is 100nm iv. Accuracy is greater of either 0.2% or 2nm (material dependent) v. Precision is 0.02nm based on SiO2-on-Si vi. Stability is 0.05nm vii. Measurement Spot Size is 6mm diameter
6. STARTUP and SHUTDOWNa. Startup i. Verify the light source rocker switch is in the on position (top half flush with panel) and the lamp is illuminated. ii. Verify the rocker switch next to the power connector on the back of the F10-RT tool is in the “I” position and the green main power indicator on the front panel is illuminated iii. Turn on the computer (grey box mounted on back of monitor) by depressing the button shown in Figure2 iv. Turn on the monitor by depressing the rightmost power button under the display screen v. Warmup wait time must be 5 minutes for films thicker than 250nm or 15 minutes for films thinner than 25nm vi. Open the FILMeasure software located on the computer desktop b. Shutdown i. Verify sample has been removed from the stage. ii. Close the software by clicking on the (red) “x” in the upper right corner of the monitor iii. Shutdown Windows by left clicking on the “Windows” icon in the lower right corner, select the power button iv. Turn off the monitor. |
For details regarding recipe editing, please visit section 2 of the User's Manual for a very deep dive into recipe parameters:
View file | ||||
---|---|---|---|---|
|
View file | ||||
---|---|---|---|---|
|
Questions & Troubleshooting
Process Library