| Page Properties | ||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| ||||||||||||||||
|
/wiki/spaces/BNCWiki/pages/6240674
iLab Name: Thermo Scientific Apreo S
iLab Kiosk: Purdue Electron Microscopy Facility
FIC: Rosa Diaz
Owner: Alejandro Ramirez
Location: Cleanroom - N Bay
Maximum Wafer Size: 6"/150 mm
| Table of Content Zone | ||||||||
|---|---|---|---|---|---|---|---|---|
| ||||||||
|
Overview
General Description
Specifications
Electron optics
- High-resolution field emission SEM column with:
- High-stability Schottky field emission gun to provide stable high-resolution analytical currents
- Compound final lens: a combined electrostatic, field-free magnetic and immersion magnetic objective lens*
- 60° objective lens geometry: allows tilting larger samples
- Automated heated apertures to ensure cleanliness and touch free aperture changes
- Through-the-lens differential pumping for low vacuum* reduces beam skirting for the most accurate analysis and highest resolution • Beam deceleration with stage bias from -4000 V to +600 V
- Continuous beam current control and optimized aperture angle
- Double stage scanning deflection
- Easy gun installation and maintenance – auto bake-out, auto start, no mechanical alignments
- Guaranteed minimal source lifetime: 24 months
Electron Beam Resolution at optimum WD
- 30 kV - 0.8 nm
- 15 kV - 0.7 nm
- 1 kV - 1.0 nm
Electron beam parameter space
- Compound Final lens
- Beam current range: 1 pA to 400 nA
- Accelerating voltage range: 200 V–30 kV
- Landing energy range: 20 eV–30 keV
- Max. Horizontal Field Width: 3.0 mm at 10 mm WD (corresponds to 29x minimum magnification).
Stage and sample
- Type - Eucentric goniometer stage, 5-axes motorized
- XY - 110 × 110 mm
- Repeatability - < 3.0 μm (@ 0° tilt)
- Motorized Z - 65 mm
- Rotation - n × 360° Tilt -15° / +90°
- Max. sample height - Clearance 85 mm to eucentric point
- Max. sample weight - 500 g in any stage position (up to 2 kg at 0° tilt)
- Max. sample size - 122 mm diameter with full X,Y, rotation (larger samples possible with limited stage travel or rotation)
Sample Requirements and Preparation
Standard Operating Procedure
Process Library
References| Expand |
|---|
QUICK GUIDE (Complete Guide in computer desktop) i Vent system (wait ~3 minutes) ii Load sample on Multipurpose Stub holder (MSH)
iii Pump system (wait ~3 minutes) iv Take Nav Cam Picture a.Zero x and y coordinates b.Stage – Take Nav-Cam Photo v Define Mode and Detector vi Watch while moving stage holder up slowly until 10mm initial Working Distance is reached |
Questions & Troubleshooting
steps the Z-direction of the stage. vii Turn Beam ON
viii Find area of interest. Adjust Magnification, Focus and Link. Fix Stigmation and Alignments. ix Take Picture x Turn Beam Off xi Vent system (wait 3 minutes) xii Unload sample on Universal Standard Holder (USH). xiii Pump system (wait 3 minutes) If needed, open User Guide (Help Tab) or read Apreo Manual |
Questions & Troubleshooting
Any questions? Please write them down here or contact the Electron Microscopy Staff
References
- Inkson, B. J. "Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) for materials characterization." Materials characterization using nondestructive evaluation (NDE) methods. Woodhead Publishing, 2016. 17-43.
- Sharma, Surender Kumar, et al., eds. Handbook of Materials Characterization. Springer International Publishing, 2018.
- Reimer, Ludwig. Scanning electron microscopy: physics of image formation and microanalysis. Vol. 45. Springer, 2013.
Manufacturer References
Manufacturer References - Internal Resources