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Problem Reporting Guide
Problem Reporting Guide
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Status
Installing
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Issue Date and Description


Estimated Fix Date and Comment


Responding Staff
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Francis


Plasma-Therm Apex SLR HDPCVD

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iLab Name
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FIC

Shared

Owner

Francis Manfred

Location

Cleanroom - K Bay

Max. Wafer

6"

Internal Page
Staff Page



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Table of Contents
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eLog - General Etching
eLog - General Etching
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Overview

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TypeMaterialsRestricted MaterialsAvailable GasesMax RF PowerWafer Size
ICP RIESi, Oxides, III-IV's, Ti, Al, SiCAu, Ag, Pt, CuAr, CHF3, CF4, SF6, Cl2, N2, O2, BCl3, H2, C4F82000 ICP / 600 Platen6 inch (150 mm) SEMI Specification



General Description

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Warning

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Specifications

Technology Overview - Remove if multiple tools use the same technology/process

 

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Specifications


Factory Support:

     Plasma-Therm APEX SLR Website

     Paris Harvey - Field Service Engineer

  • 727-687-7947 mobile
  • paris.harvey@plasmatherm.com
  • Paris did the initial tool commissioning and installation in August 2019. He was great to work with and had worked in manufacturing on these tools as well, so he knew it inside and out.

     JJ Whitehead - Field Service Engineer


     Plasma Power Supply

  • 600W 13.56MHz Bias Supply
  • 2kW 2MHz ICP




Sample Requirements and Preparation


Standard Operating Procedure

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Questions & Troubleshooting



Process Library


References