Plasma-Therm Apex SLR ICP RIE Etcher

Plasma-Therm Apex SLR ICP RIE Etcher

 

Status

Up

Issue Date and Description

The new Matching Network has been installed and the tool is working properly.

Estimated Fix Date and Comment

 

Responding Staff

Francis

Plasma-Therm Apex SLR HDPCVD

iLab Name

Plasma-Therm Apex SLR ICP RIE Etcher

iLab Kiosk

BRK Etch Core

FIC

Shared

Owner

Francis Manfred

Location

Cleanroom - K Bay

Max. Wafer

6"

Internal Page

 

Staff Page

 

Overview

Type

Materials

Restricted Materials

Available Gases

Max RF Power

Wafer Size

Type

Materials

Restricted Materials

Available Gases

Max RF Power

Wafer Size

ICP RIE

Si, Oxides, III-IV's, Ti, Al, SiC,SiNx

Au, Ag, Pt, Cu

Ar, CHF3, CF4, SF6, Cl2, N2, O2, BCl3, H2

2000 ICP / 600 Platen

6 inch (150 mm) SEMI Specification

General Description

 

 

Specifications

 

Factory Support:

     Plasma-Therm APEX SLR Website

     Paris Harvey - Field Service Engineer

  • 727-687-7947 mobile

  • paris.harvey@plasmatherm.com

  • Paris did the initial tool commissioning and installation in August 2019. He was great to work with and had worked in manufacturing on these tools as well, so he knew it inside and out.

     JJ Whitehead - Field Service Engineer

 

     Plasma Power Supply

  • 600W 13.56MHz Bias Supply

  • 2kW 2MHz ICP

 

 

 

Sample Requirements and Preparation

 

Standard Operating Procedure

 

Questions & Troubleshooting


 

Process Library


References

 

 

 

Comments