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idFunctionality

Insert excerpt
Problem Reporting Guide
Problem Reporting Guide
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StatusUP

Issue Date and Description

2/8/2020 Contamination Issue

Estimated Fix Date and Comment

2/13/2020 Pole piece has been properly cleaned
Responding Staff

/wiki/spaces/BNCWiki/pages/6240674

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Alejandro Alcaraz






iLab Name: Thermo Scientific Apreo S
iLab Kiosk: Purdue Electron Microscopy Facility
FIC: Rosa Diaz
Owner:

Xingtao Liu

Alejandro Ramirez
Location: Cleanroom - N Bay
Maximum Wafer Size: 6"/150 mm


Table of Content Zone
locationtop
styledisc

Table of Contents
outlinetrue
indent25px
stylenone



Overview

General Description

The most versatile high-performance SEM. The Thermo Scientific™ Apreo scanning electron microscope's (SEM) revolutionary compound lens design combines electrostatic and magnetic immersion technology to yield unprecedented resolution and signal selection. The Apreo SEM benefits from the unique in-lens backscatter detection, which provides excellent materials contrast, even at tilt, short working distance, or on sensitive samples.

Expand
titleSpecifications

Electron optics

  • High-resolution field emission SEM column with: 
    • High-stability Schottky field emission gun to provide stable high-resolution analytical currents 
    • Compound final lens: a combined electrostatic, field-free magnetic and immersion magnetic objective lens* 
    • 60° objective lens geometry: allows tilting larger samples 
  • Automated heated apertures to ensure cleanliness and touch free aperture changes 
  • Through-the-lens differential pumping for low vacuum* reduces beam skirting for the most accurate analysis and highest resolution • Beam deceleration with stage bias from -4000 V to +600 V 
  • Continuous beam current control and optimized aperture angle 
  • Double stage scanning deflection 
  • Easy gun installation and maintenance – auto bake-out, auto start, no mechanical alignments 
  • Guaranteed minimal source lifetime: 24 months

Detectors 

  • In lens detectors 

               - T1 (BSE), T2 (SE) and T3 (BSE and SE) 

  • Out of lens detectors 

               - ETD (BSE and SE)

Electron Beam Resolution at optimum WD

  • 30 kV - 0.8 nm
  • 15 kV - 0.7 nm
  • 1 kV - 1.0 nm

Optimal Working Distance

10 mm - Initial working distance (Z direction after focusing and linking the sample point of interest at the 10 mm mark)

5 mm - Optimal working distance (Z direction after focusing and linking the sample point of interest at the 10 mm mark)

2 mm - Best working distance (Z direction after focusing and linking the sample point of interest at the 10 mm mark)

NOTE: Always observe your sample, move the stage up from home position towards the 10 mm mark. Focus and link the HIGHEST point of your sample at the 10 mm mark.

Electron beam parameter space

  • Compound Final lens
  • Beam current range: 1 pA to 400 nA 
  • Accelerating voltage range: 200 V–30 kV 
  • Landing energy range: 20 eV–30
keV 
  • Max. Horizontal Field Width: 3.0 mm at 10 mm WD (corresponds to 29x minimum magnification).
    • keV

    Stage and sample

    • Type - Eucentric goniometer stage, 5-axes motorized 
    • XY range - 110 × 110 mm
    • Z range - 65 mm 
    • Rotation - n × 360°
    • Tilt -15° / +90° 
    • Max. sample height - Clearance 85 mm to eucentric point 
    • Max. sample weight - 500 g in any stage position (up to 2 kg at 0° tilt) 
    • Max. sample size - 122 mm diameter with full X,Y, rotation (larger samples possible with limited stage travel or rotation)

    Apreo Data Sheet

    Sample Requirements and Preparation

    Samples should be conductive to maximize sample imaging. With conductive samples features of 10nm can be observed with 5kV. Nonconductive samples can still be imaged, but not small features, limiting smallest resolutions to hundreds of nm, even microns, at low beam voltages (1-5kV). Non-conductive samples can become conductive if they are coated with Carbon, Au-Pd, or Silver paint.

    Standard Operating Procedure

    Expand
    titleQuick guide... click here to expand

    QUICK GUIDE (Complete Guide in computer desktop)

                i           Vent system (wait ~3 minutes)

               ii           Load sample on Multipurpose Stub holder (MSH)

    1. Avoid stubs with dimensions that exceed the MSH area.

              iii          Pump system (wait ~3 minutes)

              iv         Take Nav Cam Picture

                         a.Zero x and y coordinates

                         b.Stage – Take Nav-Cam Photo

               v           Define Mode and Detector

              vi          Watch while moving stage holder up slowly until

     10mm initial Working Distance is reached

    1. Use scroll wheel of mouse or move in 10mm

    steps the Z-direction of the stage.

             vii         Turn Beam ON

    1. Initial Voltage 1-5kV

             viii        Find area of interest. Adjust Magnification, Focus

    and Link. Fix Stigmation and Alignments.

              ix          Take Picture

               x           Turn Beam Off

              xi          Vent system (wait 3 minutes)

             xii         Unload sample on Universal Standard Holder (USH).

             xiii        Pump system (wait 3 minutes)

    If needed, open User Guide (Help Tab) or read Apreo Manual

    Training Manual

    Questions & Troubleshooting

    Any questions? Please write them down here or contact the Electron Microscopy Staff


    References

    • Inkson, B. J. "Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) for materials characterization." Materials characterization using nondestructive evaluation (NDE) methods. Woodhead Publishing, 2016. 17-43.
    • Sharma, Surender Kumar, et al., eds. Handbook of Materials Characterization. Springer International Publishing, 2018.
    • Reimer, Ludwig. Scanning electron microscopy: physics of image formation and microanalysis. Vol. 45. Springer, 2013.


    Manufacturer Website




    Page Properties
    idFunctionality

    Insert excerpt
    Problem Reporting Guide
    Problem Reporting Guide
    nopaneltrue

    Image Added  

    StatusUP

    Issue Date and Description

    2/8/2020 Contamination Issue

    Estimated Fix Date and Comment

    		2/13/2020 Pole piece has been properly cleaned
    Responding StaffAlejandro Alcaraz






    iLab Name: Thermo Scientific Apreo S
    iLab Kiosk: Purdue Electron Microscopy Facility
    FIC: Rosa Diaz
    Owner: Alejandro Ramirez
    Location:     Cleanroom - N Bay
    Maximum Wafer Size:     6"/150 mm


    Table of Content Zone
    locationtop
    styledisc

    Table of Contents
    outlinetrue
    indent25px
    stylenone



    Overview

    General Description

    The most versatile high-performance SEM. The Thermo Scientific™ Apreo scanning electron microscope's (SEM) revolutionary compound lens design combines electrostatic and magnetic immersion technology to yield unprecedented resolution and signal selection. The Apreo SEM benefits from the unique in-lens backscatter detection, which provides excellent materials contrast, even at tilt, short working distance, or on sensitive samples.

    Expand
    titleSpecifications

    Electron optics

    • High-resolution field emission SEM column with: 
      • High-stability Schottky field emission gun to provide stable high-resolution analytical currents 
      • Compound final lens: a combined electrostatic, field-free magnetic and immersion magnetic objective lens* 
      • 60° objective lens geometry: allows tilting larger samples 
    • Automated heated apertures to ensure cleanliness and touch free aperture changes 
    • Through-the-lens differential pumping for low vacuum* reduces beam skirting for the most accurate analysis and highest resolution • Beam deceleration with stage bias from -4000 V to +600 V 
    • Continuous beam current control and optimized aperture angle 
    • Double stage scanning deflection 
    • Easy gun installation and maintenance – auto bake-out, auto start, no mechanical alignments 
    • Guaranteed minimal source lifetime: 24 months

    Detectors 

    • In lens detectors 

                   - T1 (BSE), T2 (SE) and T3 (BSE and SE) 

    • Out of lens detectors 

                   - ETD (BSE and SE)

    Electron Beam Resolution at optimum WD

    • 30 kV - 0.8 nm
    • 15 kV - 0.7 nm
    • 1 kV - 1.0 nm

    Optimal Working Distance

    10 mm - Initial working distance (Z direction after focusing and linking the sample point of interest at the 10 mm mark)

    5 mm - Optimal working distance (Z direction after focusing and linking the sample point of interest at the 10 mm mark)

    2 mm - Best working distance (Z direction after focusing and linking the sample point of interest at the 10 mm mark)

    NOTE: Always observe your sample, move the stage up from home position towards the 10 mm mark. Focus and link the HIGHEST point of your sample at the 10 mm mark.

    Electron beam parameter space

    • Compound Final lens
    • Beam current range: 1 pA to 400 nA 
    • Accelerating voltage range: 200 V–30 kV 
    • Landing energy range: 20 eV–30 keV

    Stage and sample

    • Type - Eucentric goniometer stage, 5-axes motorized 
    • XY range - 110 × 110
    mm 
  • Repeatability - < 3.0 μm (@ 0° tilt) 
    • Motorized Z
    • mm
    • Z range - 65 mm 
    • Rotation - n × 360°
    • Tilt -15° / +90° 
    • Max. sample height - Clearance 85 mm to eucentric point 
    • Max. sample weight - 500 g in any stage position (up to 2 kg at 0° tilt) 
    • Max. sample size - 122 mm diameter with full X,Y, rotation (larger samples possible with limited stage travel or rotation)

    Apreo Data Sheet

    Sample Requirements and Preparation

    Samples should be conductive to maximize sample imaging. With conductive samples features of 10nm can be observed with 5kV. Nonconductive samples can still be imaged, but not small features, limiting smallest resolutions to hundreds of nm, even microns, at low beam voltages (1-5kV). Non-conductive samples can become conductive if they are coated with Carbon, Au-Pd, or Silver paint.

    Standard Operating Procedure

    Process Library

    References

    Manufacturer References

    Manufacturer Website

    Manufacturer References - Internal Resources

    Apreo Data Sheet
    Expand

    Questions & Troubleshooting

    titleQuick guide... click here to expand

    QUICK GUIDE (Complete Guide in computer desktop)

                i           Vent system (wait ~3 minutes)

               ii           Load sample on Multipurpose Stub holder (MSH)

    1. Avoid stubs with dimensions that exceed the MSH area.

              iii          Pump system (wait ~3 minutes)

              iv         Take Nav Cam Picture

                         a.Zero x and y coordinates

                         b.Stage – Take Nav-Cam Photo

               v           Define Mode and Detector

              vi          Watch while moving stage holder up slowly until

     10mm initial Working Distance is reached

    1. Use scroll wheel of mouse or move in 10mm

    steps the Z-direction of the stage.

             vii         Turn Beam ON

    1. Initial Voltage 1-5kV

             viii        Find area of interest. Adjust Magnification, Focus

    and Link. Fix Stigmation and Alignments.

              ix          Take Picture

               x           Turn Beam Off

              xi          Vent system (wait 3 minutes)

             xii         Unload sample on Universal Standard Holder (USH).

             xiii        Pump system (wait 3 minutes)

    If needed, open User Guide (Help Tab) or read Apreo Manual

    Training Manual

    Questions & Troubleshooting

    Any questions? Please write them down here or contact the Electron Microscopy Staff


    References

    • Inkson, B. J. "Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) for materials characterization." Materials characterization using nondestructive evaluation (NDE) methods. Woodhead Publishing, 2016. 17-43.
    • Sharma, Surender Kumar, et al., eds. Handbook of Materials Characterization. Springer International Publishing, 2018.
    • Reimer, Ludwig. Scanning electron microscopy: physics of image formation and microanalysis. Vol. 45. Springer, 2013.


    Manufacturer Website