2024-12-20 to 2025-01-02: Reduced Holiday Operations

Dear Birck Research Community,

The Purdue winter recess begins effective Friday afternoon December 20th and concludes Thursday morning, January 2. The university is officially closed during this time. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Click the link above to get more detail about equipment conditions and rules.

Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

Status	PROBLEM
Issue Date and Description	2/8/2020 Beam turns itself off after a few seconds
Estimated Fix Date and Comment
Responding Staff

/wiki/spaces/BNCWiki/pages/6240674

iLab Name: Thermo Scientific Apreo S
iLab Kiosk: Purdue Electron Microscopy Facility
FIC: Rosa Diaz
Owner: Alejandro Ramirez
Location: Cleanroom - N Bay
Maximum Wafer Size: 6"/150 mm

Overview

General Description

Specifications

Electron optics

High-resolution field emission SEM column with:
- High-stability Schottky field emission gun to provide stable high-resolution analytical currents
- Compound final lens: a combined electrostatic, field-free magnetic and immersion magnetic objective lens*
- 60° objective lens geometry: allows tilting larger samples
Automated heated apertures to ensure cleanliness and touch free aperture changes
Through-the-lens differential pumping for low vacuum* reduces beam skirting for the most accurate analysis and highest resolution • Beam deceleration with stage bias from -4000 V to +600 V
Continuous beam current control and optimized aperture angle
Double stage scanning deflection
Easy gun installation and maintenance – auto bake-out, auto start, no mechanical alignments
Guaranteed minimal source lifetime: 24 months

Electron Beam Resolution at optimum WD

30 kV - 0.8 nm
15 kV - 0.7 nm
1 kV - 1.0 nm

Electron beam parameter space

Compound Final lens
Beam current range: 1 pA to 400 nA
Accelerating voltage range: 200 V–30 kV
Landing energy range: 20 eV–30 keV
Max. Horizontal Field Width: 3.0 mm at 10 mm WD (corresponds to 29x minimum magnification).

Stage and sample

Type - Eucentric goniometer stage, 5-axes motorized
XY - 110 × 110 mm
Repeatability - < 3.0 μm (@ 0° tilt)
Motorized Z - 65 mm
Rotation - n × 360° Tilt -15° / +90°
Max. sample height - Clearance 85 mm to eucentric point
Max. sample weight - 500 g in any stage position (up to 2 kg at 0° tilt)
Max. sample size - 122 mm diameter with full X,Y, rotation (larger samples possible with limited stage travel or rotation)

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting

Process Library

References

Manufacturer References

Manufacturer Website

Manufacturer References - Internal Resources

Apreo Data Sheet

Thermo Scientific Apreo S SEM