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iLab Name: Fiji200 ALD
iLab Kiosk: BRK Growth Core
FIC: Zhihong Chen
Owner: Jerry Shepard
Location: Cleanroom - G Bay
Maximum Wafer Size: 8"/200 mm
Overview
| Type | Materials | Restricted Materials | Available Gases | Wafer Size |
|---|---|---|---|---|
| Thermal / Plasma ALD | Precursors: Trimethylaluminum (Aluminum Oxide precursor)(Strem #98-4003 25G) Tetrakis(dimethylamino)hafnium (Hafnium Oxide precursor)(Strem #98-4021-25G) Tris(dimethylamino)silane (Silicon Oxide precursor)(Sigma-Aldrich #759562-25G) | Nothing on backside, mTorr outgassing materials, thermally unstable | Carrier Gas: Argon Plasma Gases: Argon, Nitrogen, Oxygen, Hydrogen | Small pieces up to full 8 inch wafer. Maximum sample thickness is approximately 6mm. |
General Description
General use ALD for Al2O3, and HfO2
Specifications
Easily configurable for other materials
Technology Overview
Clean, vacuum compatible non-outgassing materials. Check with Jerry Shepard for compatibility.
Sample Requirements and Preparation
Small silicon samples, on the order of 5 x 5 mm and smaller, can be lost in the chamber during pumping. These samples cannot be retrieved. A good solution to this problem is presented in the image below. Two glass slides are placed such that they are perpendicular to the loading tool arm. The sample is placed between these two slides to shield the sample from gas flows created by initial pumping and stabilize its position on the chuck.
New glass slides are not clean! You must clean them using the standard TAI solvent cleaning process before placing them on the chuck or inside the ALD chamber.
Standard Operating Procedure
Questions & Troubleshooting
How do I know if my growth proceeded as expected?
The Fiji does not provide direct feedback that ALD growth has taken place. The best indication we can get from the Fiji itself is tool performance throughout the recipe. This is easily checked by reviewing the pressure peaks associated with your growth process. Upon close examination, you will find two sets of peaks, one from the precursor material, and one from the oxidizing material. These pulses alternate on the pressure graph so that one pulse will be precursor (precursor is the very first pulse in standard recipes), followed by oxidizing agent, followed again by precursor and so on for the number of cycles defined in the recipe. In a successful growth, all precursor pulses should be roughly equivalent in peak height and all oxidizer pulses should be roughly equivalent in peak height. Comparing an oxidizer to precursor pulse will only indicate differences/similarities in vapor pressure for the two materials. Also worth noting, the first couple pulses of either precursor or oxidizer may be higher than the remaining process as they have had more time to vaporize while idle. Since ALD is a self limiting process, this should have little to no effect on your growth.
| Instructions | Graphics |
|---|---|
We have recently developed a tool and placed it on the desktop of the Fiji computer. You will find a spreadsheet called "Growth Check.xlsm". |
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Open this spreadsheet, and press the |
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An Open file dialog will launch for you to select the pressure log data from your growth process. This should open up in the appropriate folder by default. You will see data logs from all recipes run on the system in the form of .txt files. Find the file associated with your growth, select, and press Open. File names are formatted as: Year_Month_Day_Hour_Minute_Second_Recipe_Name.txt Hour field is in 24 hour format example: File name "2019_08_21-15-38-21_Thermal_Al2O3_250C.txt" means: The recipe named "Thermal_Al2O3_250.txt" was ran, starting at 3:38:21 pm on August 21, 2019. |
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| Spreadsheet macro will run behind the scene and end with a dialog box stating "Process Complete", press OK. |
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| You should now see a chart with data from the fifth cycle and last cycle of your process. Each frame should contain two pulses as shown in the example data. If peaks are missing or significantly different between the frames, your growth likely experienced a problem and should be investigated. |
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Process Library
References
Per E-mail on 5/8/2018 from Adam Bertuch