Deposition
Overview
At Birck, over 30 systems provide a variety of methods to deposit over 60 different metals, dielectrics, and organics. Capabilities include:
Atomic Layer Deposition (ALD)
Chemical Vapor Deposition (CVD)
Plasma Enhanced Chemical Vapor Deposition (PECVD)
High Density Plasma CVD (HDPCVD)
E-beam Evaporation
DC/RF Sputtering
multi-deposition (E-Beam Evaporation + Sputtering)
GaN Molecular Beam Epitaxy (MBE)
PVD Pulsed Laser Deposition (PLD)
Electrodeposition