Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

Status	Up
Issue Date and Description
Estimated Fix Date and Comment
Responding Staff	Francis

Plasma-Therm Apex SLR HDPCVD

iLab Name	Plasma-Therm ICP RIE
iLab Kiosk
FIC	Shared
Owner	Francis Manfred
Location	Cleanroom - K Bay
Max. Wafer	6"
Internal Page
Staff Page

Error rendering macro 'excerpt-include' : User 'null' does not have permission to view the page 'eLog - General Etching'.

Overview

Type	Materials	Restricted Materials	Available Gases	Max RF Power	Wafer Size
ICP RIE	Si, Oxides, III-IV's, Ti, Al, SiC	Au, Ag, Pt, Cu	Ar, CHF₃, CF₄, SF₆, Cl₂, N₂, O₂, BCl₃, H₂	2000 ICP / 600 Platen	6 inch (150 mm) SEMI Specification

General Description

Specifications

Factory Support:

Plasma-Therm APEX SLR Website

Paris Harvey - Field Service Engineer

727-687-7947 mobile
paris.harvey@plasmatherm.com
Paris did the initial tool commissioning and installation in August 2019. He was great to work with and had worked in manufacturing on these tools as well, so he knew it inside and out.

JJ Whitehead - Field Service Engineer

727-458-1960
jonathan.whitehead@plasma-therm.com

Plasma Power Supply

600W 13.56MHz Bias Supply
2kW 2MHz ICP

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting