Nitric Oxide Anneal
DO NOT LEAVE TUBE UNATTENDED WHEN Nitric Oxide GAS IS BEING DISPENSED.
For long anneals either plan for an interval break or have someone else trained on the tube take over. If no-one is present at the tube, it should NOT be dispensing NO gas!
Limited Use
Due to cleanliness and contamination concerns, this furnace tube is limited to authorized users. Please contact Rich Hosler for more info.
THIS FURNACE WILL BE UNAVAILABLE STARTING 3/1/2024 AND RELOCATED.
THERE IS NO ESTIMATED DURATION BUT WE WILL WORK TO MINIMIZE DOWNTIME.
iLab Name: Nitric Oxide Anneal
iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler
Location: Cleanroom - P Bay
Maximum Wafer Size: 3"/75 mm
This tube is currently configured for Prof. Chen's group as of 2/15/2024.
Overview
General Description
Small bore, high temperature furnace for annealing silicon carbide.
Specifications
- Max Temperature (°C): 1150°C
- Max Processing Time (min):
- Available Gas: Nitric Oxide, and Argon
- Vacuum Capability:
- Max Wafer Size: 3"/75 mm
Sample Requirements and Preparation
If possible, samples should be Piranha cleaned for 10 minutes. If this is not possible due to material incompatibility, a TAI Solvent clean followed by a mandatory DI water rinse step is permissible.