Technology Overview

Spin coating of photoresist allows a uniform layer to be distributed on a substrate.

Representative Coating Cycle

Process Library

NOTE: Spinners are controlled with specific recipes. The controller holds 30 recipes in storage for use. Users need to verify that their spin recipe is correct for their application. Press mode button once to enter edit mode. Cursor will be present on top row to indicate edit mode. Press left/right arrow keys to move to the parameter that requires change and press the up/down arrows to increase or decrease the parameter amount. Press enter to save changes in that step before moving to another step. Press the mode button again to exit edit mode and enter run mode.

Typical Recipe:
Step 0:   Values should be set to 0 or "None". Disp should be rounded up to the nearest chuck size, and Disp Time may be set to a nonzero value to avoid the "Homing" step after spinning.
Step 1:   Timed ramp and dwell at process rpm.
Step 2:   Timed ramp down to zero rpm / unload

AZ1518

Standard Spin, AZ1518, no dispersal steps

Standard Spin, AZ1518, initial dispersal spin

References

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