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• Heidelberg MLA150 Maskless Aligner: for mask-making or direct write photolithography

• Suss MA6 Mask Aligner

• Suss MJB3 UV400 Mask Aligner

• Suss MJB4 UV400 Mask Aligner

JEOL JBX-8100FS

• 100kV max beam energy

• 125 MHz scan speed

• Resolutions down to 7nm

• 2 Modes:

  • High Throughput - 1000um Field Size

  • High Resolution - 100um Field Size

• Cassettes for pieces: 3”, 4”, 6” wafers, 5” photomasks

• GenISys Beamer software

Raith: e LiNE

• 30kV max beam energy

• 20 MHz scan speed

• Resolutions down to 18nm

• Standard or Ultra-flat Cassette

• Up to 4” wafer

• Excellent SEM imaging

• Excellent for work on nanowires, graphene, carbon nanotubes

• Nanonex NX-2000: nano-imprint lithography tool for making multiple copies of small geometry patterns

• PLS6MW Laser Engraver

• Photoresist Dry Film Laminator

• Interference Lithography System

• Laurell EDC-650 Spin Processor

Any patterning begins with a pattern, usually in GDS or OAS. See this youtube tutorial on KLayout: https://www.youtube.com/channel/UC45cUNKyJLlRDqCsL1QZFPQ/videos