Versions Compared

Key

  • This line was added.
  • This line was removed.
  • Formatting was changed.


Page Properties
idFunctionality

Insert excerpt
Problem Reporting Guide
Problem Reporting Guide
nopaneltrue

5/27/2022 if parts don't need to be ordered.
StatusUpUP
Issue Date and Description
System back online10/28/2024 Breaker work delayed, cancel previous plan
Estimated Fix Date and Comment


Responding StaffDave Lubeski/Dan Witter



Page Properties
idInfo

Insert excerpt
e-Log Link - Sputtering System
e-Log Link - Sputtering System
nopaneltrue

iLab NameC - PVD Sputtering System - 4 Target Magnetic Sources
iLab KioskBRK Evaporation Sputtering Core
FICJoerg Appenzeller
OwnerDave Lubelski
LocationCleanroom - S Bay
Max. Wafer4"/100 mm



Page Properties
idSources


Current SourcesCoFeB, MgO, Ru, Ta, CoCrPt, CoFe
Potential SourcesCoFeB, MgO, Ru, Ta, CoCrPt, CoFe




Table of Content Zone
locationtop
styledisc

Table of Contents
outlinetrue
indent25px
stylenone


Overview

General Description

6 target magnetic sputtering system.

Specifications


Technology Overview

 No Organics/Polymers Allowed


Sample Requirements and Preparation



Standard Operating Procedure

Please Note: This instrument is billed per  use  based on a 2 hour block

Example : 1  user only uses the tool  per use.  When you vent the system and unload your sample that concludes your reservation .  

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses


Questions & Troubleshooting



Process Library


References