PVD Sputtering System - 6 Target Magnetic Sources
Status | UP |
|---|---|
Issue Date and Description | 10/17/2025 Turbo pump will not stay on |
Estimated Fix Date and Comment | 12/17/2025 New turbo pump has been installed; system has been stable at high vacuum. |
Responding Staff | Dave Lubeski/Dan Witter |
iLab Name | |
|---|---|
iLab Kiosk | |
FIC | Joerg Appenzeller |
Owner | |
Location | Cleanroom - S Bay |
Max. Wafer | 4"/100 mm |
Current Sources | CoFeB, MgO, Ru, Ta, CoCrPt, CoFe |
|---|---|
Potential Sources | CoFeB, MgO, Ru, Ta, CoCrPt, CoFe |
Overview
General Description
6 target magnetic sputtering system.
Specifications
Technology Overview
No Organics/Polymers Allowed
Sample Requirements and Preparation
Standard Operating Procedure
Please Note: This instrument is billed per use based on a 2 hour block
Example : 1 user only uses the tool per use. When you vent the system and unload your sample that concludes your reservation .
Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses
Questions & Troubleshooting
Process Library
References