PVD Sputtering System - 6 Target Magnetic Sources

PVD Sputtering System - 6 Target Magnetic Sources

Status

Down

Issue Date and Description

10/17/2025 Turbo pump will not stay on

Estimated Fix Date and Comment

New turbo pump has arrived and is in the subfab; installation will require coordinating several people and getting vendor input and guidance, and will be planned for during the upcoming fall shutdown

Responding Staff

Dave Lubeski/Dan Witter

iLab Name

C - PVD Sputtering System - 4 Target Magnetic Sources

iLab Kiosk

BRK Evaporation Sputtering Core

FIC

Joerg Appenzeller

Owner

Dave Lubelski

Location

Cleanroom - S Bay

Max. Wafer

4"/100 mm

 

Current Sources

CoFeB, MgO, Ru, Ta, CoCrPt, CoFe

Potential Sources

CoFeB, MgO, Ru, Ta, CoCrPt, CoFe

Overview

General Description

6 target magnetic sputtering system.

Specifications

 

Technology Overview

 No Organics/Polymers Allowed

 

Sample Requirements and Preparation

 

 

Standard Operating Procedure

Please Note: This instrument is billed per  use  based on a 2 hour block

Example : 1  user only uses the tool  per use.  When you vent the system and unload your sample that concludes your reservation .  

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses



Questions & Troubleshooting


 

Process Library


References