2024-12-20 to 2025-01-02: Reduced Holiday Operations

Dear Birck Research Community,

The Purdue winter recess begins effective Friday afternoon December 20th and concludes Thursday morning, January 2. The university is officially closed during this time. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Click the link above to get more detail about equipment conditions and rules.

Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

Status	UP
Issue Date and Description	10/28/2024 Breaker work delayed, cancel previous plan
Estimated Fix Date and Comment
Responding Staff	Dave Lubeski/Dan Witter

iLab Kiosk	eLog: Submit	eLog: View/Edit	Report Problem	MSDS Documents

iLab Name	C - PVD Sputtering System - 4 Target Magnetic Sources
iLab Kiosk	BRK Evaporation Sputtering Core
FIC	Joerg Appenzeller
Owner	Dave Lubelski
Location	Cleanroom - S Bay
Max. Wafer	4"/100 mm

Current Sources	CoFeB, MgO, Ru, Ta, CoCrPt, CoFe
Potential Sources	CoFeB, MgO, Ru, Ta, CoCrPt, CoFe

Overview

General Description

6 target magnetic sputtering system.

Specifications

Technology Overview

_{No Organics/Polymers Allowed}

Sample Requirements and Preparation

Standard Operating Procedure

Please Note: This instrument is billed per use based on a 2 hour block

Example : 1 user only uses the tool per use. When you vent the system and unload your sample that concludes your reservation .

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses

Questions & Troubleshooting

Birck Nanotechnology Center Wiki

PVD Sputtering System - 6 Target Magnetic Sources