iLab Name: Thick Film Photoresist Laminator
iLab Core Kiosk: BRK Lithography Core
FIC: Michael Sinani
Owner: Mike Bayless
Location: Cleanroom - N - Bay
Maximum Wafer Size:
| Table of Content Zone | ||||||||
|---|---|---|---|---|---|---|---|---|
| ||||||||
|
Overview
General Description
The dry photoresist laminator allows application of dry-film photosensitive films for complete substrate protection and/or patterning. It can be used for semiconductor wafers or PCBs.
Specifications
Will handle a substrate up to 10" wide.
Technology Overview - Remove if multiple tools use the same technology/process
Si and PCB/FR4.
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library
References