Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
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Status	UP
Issue Date and Description
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Responding Staff

iLab Name: Thick Film Photoresist Laminator
iLab Kiosk: BRK Lithography Core
FIC: Michael Sinani
Owner: Michael Sinani
Location: Cleanroom - N Bay
Maximum Wafer Size:

Overview

General Description

The dry photoresist laminator allows application of dry-film photosensitive films for complete substrate protection and/or patterning. It can be used for semiconductor wafers or PCBs.

Specifications

Will handle a substrate up to 10" wide.

Technology Overview

Si and PCB/FR4.

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting

Birck Nanotechnology Center Wiki

Photoresist Dry Film Laminator

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