Page Comparison

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1. Design: Researcher designs layout in GDS, CIF, or DXF format using CAD program of choice.

2. Submission: NOTE: BNC is currently offering mask fabrication on an extremely limited basis, contact Joon Park for more information.
   The previous procedure was:
   1) Researcher submits a Photomask Fabrication Request in the Request Services tab in the BRK Lithography Core iLab page. 
   2) Direct link to submit a new Photomask Fabrication Request: https://purdue.ilabsolutions.com/service_item/new/4127?spt_id=9351

3. Verification: Staff converts layout into Heidelberg specific LIC file on cleanroom PC.

4. Acceptance: Researcher meets with staff in cleanroom or staff offices to inspect translated file and give final approval.
5. Fabrication: After final approval, masks will be completed within 5 business days. Fabrication consists of:
   1. Writing: Staff member writes the appropriate plate on the Heidelberg, with total write time depending on the size of the design (the Heidelberg writes at ~12 mm²/min).
   2. Wet Processing: The written plate is developed, etched, and the remaining PR is removed.
   3. Inspection: Minimum feature size is inspected and recorded.
   4. Completion: The completed photomask is placed in the dry box in cleanroom bay M. Researcher is notified electronically of completion.

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