With the install of the new spinners, materials will be segregated by spinner. Please see the following page for what spinner you will need to use for a particular material once the spinners are reclassified.
The categories and allowed chemical/spinner pairings are still being refined and your feedback would be appreciated. Please comment on this page (at the page bottom) with any questions, comments, or feedback.
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Spinner 1: General Spun on Materials (Foil required)
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Spinner 1: SCS G3P-8
Novolak Resists
Acrylic Resists
Spin on Glass EBL Resists
Conductive Polymers
Adhesion Promoters
NIL Resists & Promoters
SU-8 Epoxy
Plastics
LOR/PGMI (Cyclopentanone/PGME)
Spin on dopants/Spin on glass
Etch Protectants/Waxes
Other Spin on Materials
Cleaning Solvents
Solvents
ABSOLUTELY NO 100% HMDS, Toluene, or NMP due to contamination concerns. Discuss with BNC staff you need assistance removing resists. |
Spinner 2: Metal Ion Free, General Spun on Materials (Foil required)
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Spinner 2: SCS 6800
Novolak Resists
Acrylic Resists
Spin on Glass EBL Resists
Conductive Polymers
Adhesion Promoters
NIL Resists & Promoters
SU-8 Epoxy
Plastics
LOR/PGMI (Cyclopentanone/PGME)
Etch Protectants/Waxes
Cleaning Solvents
Solvents
ABSOLUTELY NO 100% HMDS, Toluene, or NMP due to contamination concerns. Discuss with BNC staff you need assistance removing resists. |
Spinner 3 : Acetone Soluble Resists
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Spinner 3: Laurell WS-650
Novolak Resists
Acrylic Resists
Adhesion Promoters
Solvents
ABSOLUTELY NO 100% HMDS, Toluene, or NMP due to contamination concerns. Discuss with BNC staff you need assistance removing resists. Approval for new/additional chemicals:Additional materials must be pre-approved, and material must: A) Be completely removed in acetone if dried. |
Specifically not permitted in Cleanroom
Silicones/PDMS
Reason: These are impossible to remove chemically once cured, and are not used for lithography processes. Email Joon Park for information on proper curing of HMDS outside the cleanroom.
- Sylgard 182
- Sylgard 184
100% HMDS
Reason: 100% HMDS is extremely hazardous for both skin contact and inhalation. Additionally, in air, it degrades into ammonia upon evaporation, which crosslinks common photoresist. It gives sub-optimal results compared to diluted (80% PGMEA + 20% HMDS) solutions, or SurPass. Contact Justin Wirth with any questions.
- HMDS/Hexamethyldisilazane