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Spinner Allowed Chemicals

Spinner Allowed Chemicals

Jun 27, 2019

With the install of Spinner 3, materials will be segregated by spinner. Please see the following page for what spinner you will need to use for a particular material once the spinners are reclassified.

The categories and allowed chemical/spinner pairings are still being refined and your feedback would be appreciated. Please comment on this page (at the page bottom) with any questions, comments, or feedback.

Spinner 1: General Spun on Materials (Foil required)

Spinner 1: SCS G3P-8

Complete aluminum foil covering of the spinner bowl is required!

Novolak Resists

  • AZ 1500 Series

  • AZ 5200 Series

  • AZ 9200 Series

  • Shipley 1800 Series

  • SPR 220 Series

  • ma-N 2400 Series

Acrylic EBL Resists

  • PMMA

    • 495k

    • 950k

  • PMMA + Copolymers

  • ZEP 520 A / CSAR 62 / AR-P 6200

Spin on Glass EBL Resists

  • HSQ:

    • XR-1541

    • FOX-15,16

NIL Resists

  • NXR-3000

  • Ormolayer stamp

LOR/PGMI (Cyclopentanone/PGME)

  • LOR A:

    • 3A

    • 5A

  • LOR B:

    • 3B

    • 30B

  • PGMI SF 8

SU-8 Epoxy

  • SU-8 (Any dilution)

  • SU-8 Thinner (gamma-Butyrolactone (GBL)

Adhesion Promoters

  • SurPass 3000/4000

  • 80% PGMEA + 20% HMDS Solutions

    • MCC Primer 80/20

    • Microprime MP-P20

  • Silgard A-174

  • HD Microsystems VM652

  • 3-mercaptopropyl trimethoxysilane

  • Ormoprime 08 (Be extremely careful, may be impossible to remove with normal solvents)

  • OmniCoat (PGME/Cyclopentanone)

Solvents

  • Acetone

  • Methanol

  • IPA

  • DI H20

  • PGMEA (AZ EBR Solvent, Microposit Thinner P)

  • Other: As needed for removal of approved resists. Any Litho hood approved solvents may be used as appropriate, EXCEPT HMDS, Toluene, or NMP.

Conductive Polymers

  • Aquasave 57xs

  • ESpacer 300

  • DisChem DisCharge

Plastics

  • Polyimide

  • Polystyrene

  • Poly(vinyl alcohol)

  • Poly(ethyleneimine)

Etch Protectants/Waxes

  • Protek A2-22

  • Epotek OE

  • Protek PSB and PS

  • Protek B2 and B2 Primer

  • Protek B3 and B3 Primer

Spin on dopants

  • P509 SOD

  • B155 SOD

Other Spin on Materials

  • Polypropylene carbonate

  • Graphite oxide

  • Alq3

  • Pelc conductive silver paint

  • PST toluene

  • Spin on teflon

  • Coronene in toluene

Spinner 2: Metal Ion Free, General Spun on Materials (Foil required)

Spinner 2: SCS 6800

Complete aluminum foil covering of the spinner bowl is required!

Prohibited Solvents

ABSOLUTELY NO 100% HMDS, Toluene, or NMP due to contamination concerns. Discuss with BNC staff you need assistance removing resists.

Metal and metal ion containing solutions are prohibited!

Prohibited materials, compared with Spinner 1
Spin on dopants

  • P509 SOD

  • B155 SOD

Other Spin on Materials

  • Polypropylene carbonate

  • Graphite oxide

  • Alq3

  • Pelc conductive silver paint

  • PST toluene

  • Spin on teflon

  • Coronene in toluene

Novolak Resists

  • AZ 1500 Series

  • AZ 5200 Series

  • AZ 9200 Series

  • Shipley 1800 Series

  • SPR 220 Series

  • ma-N 2400 Series

Acrylic EBL Resists

  • PMMA

    • 495k

    • 950k

  • PMMA + Copolymers

  • ZEP 520 A / CSAR 62 / AR-P 6200

Spin on Glass EBL Resists

  • HSQ:

    • XR-1541

    • FOX-15,16

NIL Resists

  • NXR-3000

  • Ormolayer stamp

LOR/PGMI (Cyclopentanone/PGME)

  • LOR A:

    • 3A

    • 5A

  • LOR B:

    • 3B

    • 30B

  • PGMI SF 8

SU-8 Epoxy

  • SU-8 (Any dilution)

  • SU-8 Thinner (gamma-Butyrolactone (GBL)

Adhesion Promoters

  • SurPass 3000/4000

  • 80% PGMEA + 20% HMDS Solutions

    • MCC Primer 80/20

    • Microprime MP-P20

  • Silgard A-174

  • HD Microsystems VM652

  • 3-mercaptopropyl trimethoxysilane

  • Ormoprime 08 (Be extremely careful, may be impossible to remove with normal solvents)

  • OmniCoat (PGME/Cyclopentanone)

Solvents

  • Acetone

  • Methanol

  • IPA

  • DI H20

  • PGMEA (AZ EBR Solvent, Microposit Thinner P)

  • Other: As needed for removal of approved resists. Any Litho hood approved solvents may be used as appropriate, EXCEPT HMDS, Toluene, or NMP.

Conductive Polymers

  • Aquasave 57xs

  • ESpacer 300

  • DisChem DisCharge

Plastics

  • Polyimide

  • Polystyrene

  • Poly(vinyl alcohol)

  • Poly(ethyleneimine)

Etch Protectants/Waxes

  • Protek A2-22

  • Epotek OE

  • Protek PSB and PS

  • Protek B2 and B2 Primer

  • Protek B3 and B3 Primer

 

Spinner 3 : Acetone Soluble Resists

Spinner 3: Laurell WS-650

Only Acetone Soluble Resists!

Only resists that may be completely removed by acetone may be used in Spinner 3. Contact Joon Park with questions about using any chemicals not specifically listed below.

Prohibited Solvents

ABSOLUTELY NO 100% HMDS, Toluene, or NMP due to contamination concerns. Discuss with BNC staff you need assistance removing resists.

 

Novolak Resists

  • AZ 1500 Series

  • AZ 5200 Series

  • AZ 9200 Series

  • Shipley 1800 Series

  • SPR 220 Series

  • ma-N 2400 Series

Acrylic EBL Resists

  • PMMA

    • 495k

    • 950k

  • PMMA + Copolymers

  • ZEP 520 A / CSAR 62 / AR-P 6200

Adhesion Promoters

  • 80% PGMEA + 20% HMDS Solutions

    • MCC Primer 80/20

    • Microprime MP-P20

Solvents

  • Acetone

  • Methanol

  • IPA

  • PGMEA (AZ EBR Solvent, Microposit Thinner P)

Approval for new/additional chemicals:

Additional materials must be pre-approved, and material must:

A) Be completely removed in acetone if dried.
B) Not polymerize in contact with acetone, PGMEA, or water.
C) Not have vapors which harden resist (NMP, Ammonia, toluene, cholorbenzene) or dope substrates.

Specifically not permitted in Cleanroom

Silicones/PDMS

Reason: These are impossible to remove chemically once cured, and are not used for lithography processes. Email Joon Park for information on proper curing of HMDS outside the cleanroom.

  • Sylgard 182

  • Sylgard 184

100% HMDS

Reason: 100% HMDS is extremely hazardous for both skin contact and inhalation. Additionally, in air, it degrades into ammonia upon evaporation, which crosslinks common photoresist. It gives sub-optimal results compared to diluted (80% PGMEA + 20% HMDS) solutions, or SurPass. Contact Justin Wirth with any questions.

  • HMDS/Hexamethyldisilazane