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| Info |
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Please see PI for sample approval. |
iLab Name: Easy Tube 3000 CVD
iLab Kiosk: BRK Growth Core
FIC: Zhihong Chen
Owner: Joon Park
Location: BRK 2221
Maximum Wafer Size: 2"/50 mm
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Overview
General Description
Graphene thermal and plasma deposition system.
Specifications
Please see PI for sample approval.
Technology Overview
Si, Cu
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library
References
| Warning |
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Shutdown Proceedures (Needs updated and moved to restricted page) This tool consumes large amounts of argon when powered down. Make sure to close the argon supply valve when powering down. |