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EasyTube 3000 CVD

EasyTube 3000 CVD

Owned by Former user (Deleted)

2025-05-05 to 2025-05-23: Semi-Annual Facility Preventive Maintenance

shutdown.jpg


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUP
Issue Date and Description


Estimated Fix Date and Comment

Responding Staff

Please see PI for sample approval.


iLab Name: Easy Tube 3000 CVD
iLab Kiosk: BRK Growth Core
FIC: Zhihong Chen
Owner: Joon Park
Location: BRK 2221
Maximum Wafer Size: 2"/50 mm

Overview

General Description

Graphene thermal and plasma deposition system.

Specifications

Please see PI for sample approval.

Technology Overview 

Si, Cu


Sample Requirements and Preparation


Standard Operating Procedure


Questions & Troubleshooting



Process Library

References


Shutdown Procedures (Needs updated and moved to restricted page)

This tool consumes large amounts of argon when powered down. (Approximately 13 LPM) Make sure to close the argon supply valve when powering down.

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