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Problem Reporting Guide
Problem Reporting Guide
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StatusUPDown
Issue Date and Description

CoFeB and CoFe sources are not loaded yet. Waiting for delivery of sources.No argon

Estimated Fix Date and Comment

111/625/212022

Responding StaffDave Lubeski



Page Properties
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iLab NameC - PVD Sputtering System - 4 Target Magnetic Sources
iLab KioskBRK Evaporation Sputtering Core
FICJoerg Appenzeller
OwnerDave Lubelski
LocationCleanroom - S Bay
Max. Wafer4"/100 mm



Page Properties
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Current SourcesCoFeB, MgO, Ru, Ta, CoCrPt, CoFe
Potential SourcesCoFeB, MgO, Ru, Ta, CoCrPt, CoFe




Table of Content Zone
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Table of Contents
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Overview

General Description

6 target magnetic sputtering system.

Specifications


Technology Overview

 No Organics/Polymers Allowed


Sample Requirements and Preparation



Standard Operating Procedure

Please Note: This instrument is billed per  use  based on a 2 hour block

Example : 1  user only uses the tool  per use.  When you vent the system and unload your sample that concludes your reservation .  

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses


Questions & Troubleshooting



Process Library


References