| Page Properties | ||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| ||||||||||||||||
|
| Info |
|---|
Please see PI for sample approval. |
iLab Name: Easy Tube 3000 CVD
iLab Kiosk: BRK Growth Core
FIC: Zhihong Chen
Owner: Joon Park
Location: BRK 2221
Maximum Wafer Size: 2"/50 mm
| Table of Content Zone | ||||||||
|---|---|---|---|---|---|---|---|---|
| ||||||||
|
Overview
General Description
Graphene thermal and plasma deposition system.
Specifications
Please see PI for sample approval.
Technology Overview
Si, Cu
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library
References
| Warning |
|---|
Shutdown Procedures (Needs updated and moved to restricted page) This tool consumes large amounts of argon when powered down. (Approximately 13 LPM) Make sure to close the argon supply valve when powering down. |