Versions Compared

Key

  • This line was added.
  • This line was removed.
  • Formatting was changed.


Page Properties
idFunctionality

Insert excerpt
Problem Reporting Guide
Problem Reporting Guide
nopaneltrue

StatusUP
Issue Date and Description


Estimated Fix Date and Comment

Responding Staff



Info

Please see PI for sample approval.



iLab Name: Easy Tube 3000 CVD
iLab Kiosk: BRK Growth Core
FIC:
Zhihong Chen
Owner: Joon Park
Location:
BRK 2221
Maximum Wafer Size: 
2"/50 mm


Table of Content Zone
locationtop
styledisc

Table of Contents
outlinetrue
indent25px
stylenone


Overview

General Description

Graphene thermal and plasma deposition system.

Specifications

Please see PI for sample approval.

Technology Overview 

Si, Cu


Sample Requirements and Preparation

 


Standard Operating Procedure


Questions & Troubleshooting

 



Process Library


References

 


Warning

Shutdown Proceedures Procedures (Needs updated and moved to restricted page)

This tool consumes large amounts of argon when powered down. (Approximately 13 LPM) Make sure to close the argon supply valve when powering down.