With the install of Spinner 3, materials will be segregated by spinner. Please see the following page for what spinner you will need to use for a particular material once the spinners are reclassified.
The categories and allowed chemical/spinner pairings are still being refined and your feedback would be appreciated. Please comment on this page (at the page bottom) with any questions, comments, or feedback.
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Spinner 1
& 2 : Acetone Soluble Resists: General Spun on Materials (Foil required)
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Spinner |
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SCS G3P-8
Novolak Resists
Acrylic EBL Resists |
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Spin on Glass EBL Resists
NIL Resists
LOR/PGMI (Cyclopentanone/PGME)
SU-8 Epoxy
Adhesion Promoters
Solvents
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Approval for new/additional chemicals:
Additional materials must be pre-approved, and material must:
A) Be completely removed in acetone if dried.
B) Not polymerize in contact with acetone, PGMEA, or water.
C) Not have vapors which harden resist (NMP, Ammonia, toluene, cholorbenzene) or dope substrates.
Spinner 3: SU-8, PGME Resists, Plastics, and other Spin-on-Materials (Foil required)
Spinner 3: SCS GSP-8
Conductive Polymers
Plastics
Etch Protectants/Waxes
Spin on dopants
Other Spin on Materials
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Spinner 2: Metal Ion Free, General Spun on Materials (Foil required)
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Spinner 2: SCS 6800
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SU-8 Epoxy
SU-8 (Any dilution)
SU-8 Thinner (gamma-Butyrolactone (GBL)
- OmniCoat (PGME/Cyclopentanone)
Plastics
Novolak Resists
Acrylic EBL Resists
Spin on Glass EBL Resists
NIL Resists
LOR/PGMI (Cyclopentanone/PGME)
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3B
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30B
SU-8 Epoxy
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Adhesion Promoters
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P509 SOD
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Spin on dopants/Spin on glass
Solvents
Conductive Polymers
Plastics
Etch Protectants/Waxes
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Other Spin on Materials
- Polypropylene carbonate
- Graphite oxide
- Alq3
- Pelc conductive silver paint
- PST toluene
- Spin on teflon
- Coronene in toluene
Cleaning Solvents
As needed for removal of approved resists. Any Litho hood approved solvents may be used as appropriate.
Spinner 4: EBL/NIL (Foil required)
Spinner 4: SCS G3P-8
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Complete aluminum foil covering of the spinner bowl is required! |
EBL Resists
- HSQ
- XR-1541
- FOX-1X
- ZEP-520
- PMMA
- 495 PMMA
- 950 PMMA
- PMMA + Compolymers
- ma-N 2400
EBL Conductive Polymers
Aquasave 57xs
ESpacer 300
Spinner 3 : Acetone Soluble Resists
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Spinner 3: Laurell WS-650
Novolak Resists
Acrylic EBL Resists
Adhesion Promoters
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NIL Resists & Promoters
- NXR-3000
- Ormolayer stamp
- Ormoprime 08 (Be extremely careful, may be impossible to remove with normal solvents)
Resist Removal Solvents
As needed for removal of approved resists. Any Litho hood approved solvents may be used as appropriate.Solvents
Approval for new/additional chemicals:Additional materials must be pre-approved, and material must: A) Be |
completely removed in acetone if dried. |
Not polymerize in contact with acetone, PGMEA, or water. |
) Not have vapors which harden resist (NMP, Ammonia, toluene, cholorbenzene) or dope substrates. |
Specifically not permitted in Cleanroom
Silicones/PDMS
Reason: These are impossible to remove chemically once cured, and are not used for lithography processes. Email Joon Park for information on proper curing of HMDS outside the cleanroom.
- Sylgard 182
- Sylgard 184
100% HMDS
Reason: 100% HMDS is extremely hazardous for both skin contact and inhalation. Additionally, in air, it degrades into ammonia upon evaporation, which crosslinks common photoresist. It gives sub-optimal results compared to diluted (80% PGMEA + 20% HMDS) solutions, or SurPass. Contact Justin Wirth with any questions.
- HMDS/Hexamethyldisilazane
AP
Ti prime
Nanoparticles
Liquid diamond monocrystalline (microdiamant)