List of pages to be added:
- Photoresist Spin Coating
- Edge bead Removal
- Pre-exposure bake
- Post-exposure bake
- Multilayer spins
- Characterization of spun films
- Etch resistance
Lithographic Processing Overview:
ICs, Lithography, and Photoresist - Henderson Research Group, GA Tech
University Nanofabrication/Cleanroom resources:
- UPenn - Singh Center for Nanotechnology
- nanoFAB - University of Alberta
- CMI - EPFL
- University of Utah - Nanofab
Manufacturer resources: