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iLab Name: GaN MBE
FIC: Michael Manfra
Owner: Geoff Gardner
Location: BNC Lab 2277
Maximum Wafer Size: 

Overview

General Description

The RIBER 2000 Molecular Beam Epitaxy (MBE) System is capable of growing on 2" substrates. This MBE features a Load Lock chamber, Reflective High Energy Electron Diffraction (RHEED) and automation software. Sources include nitrogen plasma, Ga, In, Al, and Si for doping.

Specifications

Check with Michael Manfra This tool has restricted use policies. However samples and structures can be considered for fabrication on an individual basis.

Technology Overview - Remove if multiple tools use the same technology/process

This tool has restricted use policies. However samples and structures can be considered for fabrication on an individual basis.

 

Sample Requirements and Preparation

 

Standard Operating Procedure


Questions & Troubleshooting


 

Process Library

References

 

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