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Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUP
Issue Date and Description


Estimated Fix Date and Comment


Responding Staff


iLab NameC - PVD Sputtering System - 4 Target Magnetic Sources
iLab KioskBRK Evaporation Sputtering Core
FICJoerg Appenzeller
OwnerDave Lubelski
LocationCleanroom - S Bay
Max. Wafer4"/100 mm


Current Sources
Potential Sources

Overview

General Description

6 target magnetic sputtering system.

Specifications


Technology Overview

 No Organics/Polymers Allowed


Sample Requirements and Preparation



Standard Operating Procedure

Please Note: This instrument is billed per  use  based on a 2 hour block

Example : 1  user only uses the tool  per use.  When you vent the system and unload your sample that concludes your reservation .  

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses


Questions & Troubleshooting



Process Library

References


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