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Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp*
Issue Date and Description

Ongoing issues with magnetic targets being addressed

Estimated Fix Date and Comment


Responding StaffDave Lubeski



iLab KioskeLog: SubmiteLog: View/EditReport ProblemMSDS Documents

iLab NameC - PVD Sputtering System - 4 Target Magnetic Sources
iLab KioskBRK Evaporation Sputtering Core
FICJoerg Appenzeller
OwnerDave Lubelski
LocationCleanroom - S Bay
Max. Wafer4"/100 mm


Current SourcesCoFeB, MgO, Ru, Ta, CoCrPt, CoFe
Potential SourcesCoFeB, MgO, Ru, Ta, CoCrPt, CoFe

Overview

General Description

6 target magnetic sputtering system.

Specifications


Technology Overview

 No Organics/Polymers Allowed


Sample Requirements and Preparation



Standard Operating Procedure

Please Note: This instrument is billed per  use  based on a 2 hour block

Example : 1  user only uses the tool  per use.  When you vent the system and unload your sample that concludes your reservation .  

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses


Questions & Troubleshooting



Process Library

References


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