Overview
General Description
Specifications
The JBX-8100FS is an electron-beam lithography system designed to write nanometer to submicron sized patterns using a spot beam.
Write Modes Specifications
Note: High Throughput will be almost exclusively used, contact Bill Rowe if you think you need HR mode.
High Throughput | High Resolution | |
Max. Main Field Size | 1000 μm x 1000 μm | 100 μm x 100 μm |
Max. Sub Field Size | 8 μm x 8 μm | 0.8 μm x 0.8 μm |
Min. Beam Step Size | 0.5 nm | 0.05 nm |
Min. Shape Placement Step | 1 nm | 0.1 nm |
Overlay Accuracy | ≤±20 nm | ≤±9 nm |
Field Stitching Accuracy | ≤±20 nm | ≤±9 nm |
Min. Beam Diameter | 5.1 nm | 1.8 nm |
Min. Line Width (Field Center) | <12 nm | <8 nm |
Available Currents (at BNC) | 2, 10, 30, 100 nA (200 nA available as a test file) | 0.5 nA |
Features
ZrO/W emitter
4-stage electron-beam focusing system
Accelerating voltage: 100 kV
Writing: Vector scan (within a subfield) and Step-and-repeat (electronically between subfields and physically between fields).
Beam scanning speed: ≤125 MHz
Scan speed modulation: 256 rank / 0.05 nsec resolution
Mainfield/Positioning DAC: 20-bit
Subfield/Scanning DAC: 14-bit
Focus range: ±100 μm
Max wafer size: 200 mm
Max writing area: 150 mm x 150 mm
Movable area: 190 mm x 170 mm
Stage positioning resolution: λ/1024 (~0.6 nm)
Beam current stability: 0.2% pp/hr
Beam position stability: ≤60 nm pp/hr (HT) / ≤10 nm pp/hr (HR)
Substrate thickness compatibility: 225 μm to 1.3 mm
Deflection amplitude correction and objective-lens focus correction, using the substrate height detector
Smallest features size: 4.2 nm (demonstrated by JEOL in Development of the JBX-8100FS Electron Beam Lithography System).
The JBX-8100FS is mounted on a TMC Quiet Island with STACIS III antivibration supports. Transmission is minimized at high frequencies, and unlike older anti-vibration supports, is reduced at low (<10 Hz) frequencies as well.
Sample Requirements and Preparation
Samples need to be free of outgassing contaminants, and PR must be properly baked to avoid contamination of the column
Standard Operating Procedure
SOP - JEOL JBX-8100FS E-Beam Writer
Process Control Information
Process Library
Currently empty, please contribute your processes here.
8100calculator.xlsx
Use this Excel file to assist with picking currents, shot pitches, ensuring you're within the clock headroom (<125 MHz, >8ns), to roughly estimate your write time based on the current/dose/pattern area, and track alignment mark locations.
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