Technology Overview

Spin coating of photoresist allows a uniform layer to be distributed on a substrate.

Representative Coating Cycle

Process Library

For in-depth information about photoresist properties and spin recipes, see BNC Supplied Photoresists.

Typical Recipe:
Step 0:   Values should be set to 0 or "None". Disp should be rounded up to the nearest chuck size, and Disp Time may be set to a nonzero value to avoid the "Homing" step after spinning.
Step 1:   Timed ramp and dwell at process rpm.
Step 2:   Timed ramp down to zero rpm / unload

AZ1518

Standard Spin, AZ1518, no dispersal steps

Standard Spin, AZ1518, initial dispersal spin

References

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