Skip to end of metadata
Go to start of metadata

You are viewing an old version of this page. View the current version.

Compare with Current View Page History

« Previous Version 10 Next »




Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status
: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp
Issue Date and Description

Cl2 & BCl3 & H2 will be turned off at 3:30 on Dec 22.   The tool can still be used with other gases.

Estimated Fix Date and Comment

Responding StaffFrancis

Plasma-Therm Apex SLR HDPCVD

iLab Name
iLab Kiosk


FIC

Shared

Owner

Francis Manfred

Location

Cleanroom - K Bay

Max. Wafer

6"

Internal Page
Staff Page

Error rendering macro 'excerpt-include' : User 'null' does not have permission to view the page 'eLog - General Etching'.

Overview

TypeMaterialsRestricted MaterialsAvailable GasesMax RF PowerWafer Size
ICP RIESi, Oxides, III-IV's, Ti, Al, SiCAu, Ag, Pt, CuAr, CHF3, CF4, SF6, Cl2, N2, O2, BCl3, H2, C4F82000 ICP / 600 Platen6 inch (150 mm) SEMI Specification

General Description



Specifications


Factory Support:

     Plasma-Therm APEX SLR Website

     Paris Harvey - Field Service Engineer

  • 727-687-7947 mobile
  • paris.harvey@plasmatherm.com
  • Paris did the initial tool commissioning and installation in August 2019. He was great to work with and had worked in manufacturing on these tools as well, so he knew it inside and out.

     JJ Whitehead - Field Service Engineer


     Plasma Power Supply

  • 600W 13.56MHz Bias Supply
  • 2kW 2MHz ICP




Sample Requirements and Preparation


Standard Operating Procedure


Questions & Troubleshooting



Process Library


References




  • No labels