2024-12-20 to 2025-01-02: Reduced Holiday Operations

Dear Birck Research Community,

The Purdue winter recess begins effective Friday afternoon December 20th and concludes Thursday morning, January 2. The university is officially closed during this time. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Click the link above to get more detail about equipment conditions and rules.

Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

Status	UP
Issue Date and Description
Estimated Fix Date and Comment
Responding Staff

iLab Name	Nanoscribe Photonic Professional GT2 3D Printer
iLab Kiosk	BRK Lithography Core
FIC	David Cappelleri
Owner	Mihailo Bradash & Bill Rowe
Location	BRK 2100F
Max. Wafer	4"/100 mm
Info Links	/wiki/spaces/BNCWiki/pages/6250782\| /wiki/spaces/BNCWiki/pages/6248406

Overview

General Description

The Nanoscribe Photonic Professional GT2 uses Two-Photon Polymerization (2PP) to produce filigree structures of nearly any 3D shape by high-precision 3D printing: crystal lattices, porous scaffolds, naturally inspired patterns, smooth contours, sharp edges, undercuts and bridges are all manufacturable with high resolution. The printer is capable of printing in Mesoscale, and all the way down to Nanoscale, and is designed around work in Microfluidics, Micromechanics, Micro optics, Photonics and plasmonics, Biomedical applications, and Nanostructures.

Specifications


Printing technology	Layer-by-layer Two-Photon Polymerization
Minimum XY feature size	160 nm typical; 200 nm specified*
Finest XY resolution	400 nm typical; 500 nm specified*
Finest vertical resolution	1,000 nm typical; 1,500 nm specified*
Layer distance	Variable, 0.1 – 5.0 µm*
Maximum object height	8 mm*
Build volume	100 × 100 × 8 mm³ *
Minimum surface roughness Ra	≤ 20 nm*
Max. scan speed	From 100 to 625 mm/s*

*Values may vary depending on the Solution Set, objective or resin in use

Technology Overview

Sample Requirements and Preparation

Standard Operating Procedure

Training video on 6/24/2021, (only available for Purdue users)

Questions & Troubleshooting

Process Library

References
Nanoguide Wiki: https://support.nanoscribe.com/hc/en-gb
General user login:
UN: bncstud@purdue.edu
PW: Bncstud1*

Nanoscribe Photonic Professional GT2 3D Printer