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CrossLab Name: Nanonex
FIC: Minghao Qi and Alexandra Boltasseva
Owner: Bill Rowe
Location: Cleanroom - Bay N
Maximum Wafer Size: 8"

Overview

General Description

The Nanonex is a nano-imprint lithography tool for making multiple copies of small geometry patterns.

Specifications

  • Molds and substrates from piece size up to 100mm.
  • Pressure: up to 550psi
  • Temperature: up to 250°C
  • Minimum resolution: <10nm
  • Capable of Thermal and UV (Photo) Imprinting
  • Can handle up to an 8 inch wafer
  • Quick cycle times-usually less than 2 minutes

Technology Overview

 

 

Sample Requirements and Preparation

 

Standard Operating Procedure


Questions & Troubleshooting


 

Process Library

References

 

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