Nanonex NX-2000
- Wirth, Justin C
- Former user (Deleted)
- Hosler, Richard S
2024-12-20 to 2025-01-02: Reduced Holiday Operations Dear Birck Research Community, The Purdue winter recess begins effective Friday afternoon December 20th and concludes Thursday morning, January 2. The university is officially closed during this time. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Click the link above to get more detail about equipment conditions and rules.
Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.
iLab Name: Nanonex
iLab Kiosk: BRK Lithography Core
FIC: Minghao Qi and Alexandra Boltasseva
Owner: Bill Rowe
Location: Cleanroom - N Bay
Maximum Wafer Size: 8"/200 mm
Overview
General Description
The Nanonex is a nano-imprint lithography tool for making multiple copies of small geometry patterns.
Specifications
- Molds and substrates from piece size up to 100mm.
- Pressure: up to 550psi
- Temperature: up to 250°C
- Minimum resolution: <10nm
- Capable of Thermal and UV (Photo) Imprinting
- Can handle up to an 8 inch wafer
- Quick cycle times-usually less than 2 minutes
Technology Overview
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library