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iLab Name: Nanonex
iLab Kiosk: BRK Lithography Core
FIC: Minghao Qi and Alexandra Boltasseva
Owner: Bill Rowe
Location: Cleanroom - N Bay
Maximum Wafer Size: 8"/200 mm

Overview

General Description

The Nanonex is a nano-imprint lithography tool for making multiple copies of small geometry patterns.

Specifications

Molds and substrates from piece size up to 100mm.
Pressure: up to 550psi
Temperature: up to 250°C
Minimum resolution: <10nm
Capable of Thermal and UV (Photo) Imprinting
Can handle up to an 8 inch wafer
Quick cycle times-usually less than 2 minutes

Technology Overview

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting

Nanonex NX-2000