Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

iLab Name: Nanonex
iLab Kiosk: BRK Lithography Core
FIC: Minghao Qi and Alexandra Boltasseva
Owner: Bill Rowe
Location: Cleanroom - N Bay
Maximum Wafer Size: 8"/200 mm

Overview

General Description

The Nanonex is a nano-imprint lithography tool for making multiple copies of small geometry patterns.

Specifications

• Molds and substrates from piece size up to 100mm.
• Pressure: up to 550psi
• Temperature: up to 250°C
• Minimum resolution: <10nm
• Capable of Thermal and UV (Photo) Imprinting
• Can handle up to an 8 inch wafer
• Quick cycle times-usually less than 2 minutes

Technology Overview 

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting

Process Library

References