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iLab Name: Thick Film Photoresist Laminator
iLab Kiosk:
 BRK Lithography Core
FIC:
Michael Sinani
Owner: Mike Bayless
Location:
Cleanroom - N Bay
Maximum Wafer Size: 

Overview

General Description

The dry photoresist laminator allows application of dry-film photosensitive films for complete substrate protection and/or patterning. It can be used for semiconductor wafers or PCBs.

Specifications

Will handle a substrate up to 10" wide.

Technology Overview

 Si and PCB/FR4.

 

Sample Requirements and Preparation

 

Standard Operating Procedure


Questions & Troubleshooting


 

Process Library


References

 

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